Inventor
HOCHBERG ARTHUR K
US14 patents
⚠️ This page may combine multiple inventors who share the name “HOCHBERG ARTHUR K”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
AIR PROD & CHEM
10 patentsUS5204141AApr 20, 1993
Deposition of silicon dioxide films at temperatures as low as 100 degree c. by lpcvd using organodisilane sources
AIR PROD & CHEM151 citations99
US5322712AJun 21, 1994
Process for improved quality of CVD copper films
AIR PROD & CHEM72 citations96
US5298075AMar 29, 1994
Furnace tube cleaning process
AIR PROD & CHEM77 citations96
US5626775AMay 6, 1997
Plasma etch with trifluoroacetic acid and derivatives
AIR PROD & CHEM73 citations95
US5492736AFeb 20, 1996
Fluorine doped silicon oxide process
AIR PROD & CHEM60 citations95
US5433975AJul 18, 1995
Deposition of tungsten films from mixtures of tungsten hexafluoride organohydrosilanes and hydrogen
AIR PROD & CHEM44 citations92
US4992299AFeb 12, 1991
Deposition of silicon nitride films from azidosilane sources
AIR PROD & CHEM44 citations92
US5288662AFeb 22, 1994
Low ozone depleting organic chlorides for use during silicon oxidation and furnace tube cleaning
AIR PROD & CHEM19 citations82
USRE35614ESep 23, 1997
Process for improved quality of CVD copper films
AIR PROD & CHEM13 citations74
US5013690AMay 7, 1991
Method for deposition of silicon films from azidosilane sources
AIR PROD & CHEM11 citations74