Inventor
EVERHARDUS VAN DE VEN P
US9 patents
Patents
9 patentsUS5238499AAug 24, 1993
Gas-based substrate protection during processing
NOVELLUS SYSTEMS INC411 citations99
US5230741AJul 27, 1993
Gas-based backside protection during substrate processing
NOVELLUS SYSTEMS INC118 citations98
US5882417AMar 16, 1999
Apparatus for preventing deposition on frontside peripheral region and edge of wafer in chemical vapor deposition apparatus
NOVELLUS SYSTEMS INC90 citations97
US5843233ADec 1, 1998
Exclusion guard and gas-based substrate protection for chemical vapor deposition apparatus
NOVELLUS SYSTEMS INC51 citations96
US5620525AApr 15, 1997
Apparatus for supporting a substrate and introducing gas flow doximate to an edge of the substrate
NOVELLUS SYSTEMS INC114 citations96
US5578532ANov 26, 1996
Wafer surface protection in a gas deposition process
NOVELLUS SYSTEMS INC91 citations96
US5374594ADec 20, 1994
Gas-based backside protection during substrate processing
NOVELLUS SYSTEMS INC56 citations96
US5925411AJul 20, 1999
Gas-based substrate deposition protection
NOVELLUS SYSTEMS INC72 citations95
US5769951AJun 23, 1998
Exclusion guard and gas-based substrate protection for chemical vapor deposition apparatus
NOVELLUS SYSTEMS INC51 citations95