Inventor

ONO YOSHI

US74 patents

⚠️ This page may combine multiple inventors who share the name “ONO YOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ONO YOSHI

SHARP LAB OF AMERICA INC

Method to control the interfacial layer for deposition of high dielectric constant films

Method of depositing a conductive niobium monoxide film for MOSFET gates

Method of forming a multilayer dielectric stack

Methods of using atomic layer deposition to deposit a high dielectric constant material on a substrate

Multilayer dielectric stack and method

Doped zirconia, or zirconia-like, dielectric film transistor structure and deposition method for same

Method of forming a doped metal oxide dielectric film

Aluminum-doped zirconium dielectric film transistor structure and deposition method for same

Method to perform selective atomic layer deposition of zinc oxide

Nanolaminate film atomic layer deposition method

Method for depositing a nanolaminate film by atomic layer deposition

Dual metal gate CMOS devices and method for making the same

Dose control technique for plasma doping in ultra-shallow junction formations

Method for improving electrical properties of high dielectric constant films

Use of silicon germanium and other alloys as the replacement gate for the fabrication of MOSFET

Method to deposit a stacked high-κ gate dielectric for CMOS applications

Method of forming nitrogen implanted ultrathin gate oxide for dual gate CMOS devices

Method of forming high-luminescence silicon electroluminescence device

Methods of forming a microlens array over a substrate employing a CMP stop

MOSFET threshold voltage tuning with metal gate stack control

Plasma method for fabricating oxide thin films

Device including an epitaxial nickel silicide on (100) Si or stable nickel silicide on amorphous Si and a method of fabricating the same

Nickel silicide including iridium for use in ultra-shallow junctions with high thermal stability and method of manufacturing the same

Epitaxially grown lead germanate film and deposition method

Modulated temperature method of atomic layer deposition (ALD) of high dielectric constant films

Method to fabricate a nanowire CHEMFET sensor device using selective nanowire deposition

Electroluminescent device

ZnO film with C-axis orientation

Silicon oxide thin-films with embedded nanocrystalline silicon

Strain control of epitaxial oxide films using virtual substrates

Sputter-deposited rare earth element-doped silicon oxide film with silicon nanocrystals for electroluminescence applications

Method of fabricating a p-type CaO-doped SrCu2O2 thin film

Method of making a non-volatile memory using a plasma oxidized high-k charge-trapping layer

System and method for integrating multiple metal gates for CMOS applications

Low power flash memory cell and method

Nanotip electrode electroluminescence device with contoured phosphor layer

Thin film oxide interface

MOSFET structures with conductive niobium oxide gates

Oxide interface and a method for fabricating oxide thin films

Method of fabricating a nickel silicide on a substrate

C-axis oriented lead germanate film

Ferroelastic lead germanate thin film and deposition method

Ferroelastic lead germanate thin film and deposition method

Electrode materials with improved hydrogen degradation resistance and fabrication method

Method of forming ferroelastic lead germanate thin films

C-axis oriented lead germanate film and deposition method

Method of fabricating a grayscale mask using a wafer bonding process

(unassigned)

Ferroelastic integrated circuit device

Capacitor utilizing c-axis oriented lead germanate film

GAO WEI

Semi-transparent film grayscale mask