P

Inventor

HUANG YI-JYUN

TW12 patents

Patents

12 patents
US10971588B2Apr 6, 2021

Semiconductor device including FinFET with self-align contact

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10340348B2Jul 2, 2019

Method of manufacturing finFETs with self-align contacts

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US9773879B2Sep 26, 2017

Semiconductor device and a method for fabricating the same

TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US10685880B2Jun 16, 2020

Methods for reducing contact depth variation in semiconductor fabrication

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10522634B2Dec 31, 2019

Finfet with self-aligned source/drain

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10164034B2Dec 25, 2018

Semiconductor device and a method for fabricating the same

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US12438049B2Oct 7, 2025

Methods for reducing contact depth variation in semiconductor fabrication

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12009399B2Jun 11, 2024

Semiconductor device suppressing rounded shapes of source/drain contact layers

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11495494B2Nov 8, 2022

Methods for reducing contact depth variation in semiconductor fabrication

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11398559B2Jul 26, 2022

Mitigation of time dependent dielectric breakdown

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11062945B2Jul 13, 2021

Methods for reducing contact depth variation in semiconductor fabrication

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10658486B2May 19, 2020

Mitigation of time dependent dielectric breakdown

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62