Inventor
YAMAZAKI SATORU
JP24 patents
⚠️ This page may combine multiple inventors who share the name “YAMAZAKI SATORU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJITSU LTD
13 patentsUS6222195B1Apr 24, 2001
Charged-particle-beam exposure device and charged-particle-beam exposure method
FUJITSU LTD49 citations96
US6137111AOct 24, 2000
Charged particle-beam exposure device and charged-particle-beam exposure method
FUJITSU LTD26 citations92
US6090527AJul 18, 2000
Electron beam exposure mask and method of manufacturing the same and electron beam exposure method
FUJITSU LTD25 citations92
US5849437ADec 15, 1998
Electron beam exposure mask and method of manufacturing the same and electron beam exposure method
FUJITSU LTD24 citations92
US5830612ANov 3, 1998
Method of detecting a deficiency in a charged-particle-beam exposure mask
FUJITSU LTD28 citations92
US5391886AFeb 21, 1995
Charged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure system
FUJITSU LTD36 citations92
US5304811AApr 19, 1994
Lithography system using charged-particle beam and method of using the same
FUJITSU LTD23 citations92
US5347592ASep 13, 1994
Pattern judging method and mask producing method using the pattern judging method
FUJITSU LTD19 citations82
US5256881AOct 26, 1993
Mask and charged particle beam exposure method using the mask
FUJITSU LTD20 citations82
US5432314AJul 11, 1995
Transparent mask plate for charged particle beam exposure apparatus and charged particle beam exposure process using the transparent mask plate
FUJITSU LTD10 citations74
US5952155ASep 14, 1999
Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device
FUJITSU LTD10 citations73
US5824437AOct 20, 1998
Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device
FUJITSU LTD6 citations73
US5537487AJul 16, 1996
Pattern judging method, mask producing method, and method of dividing block pattern for use in block exposure
FUJITSU LTD16 citations73