Inventor
KANNO YUTA
JP25 patents
⚠️ This page may combine multiple inventors who share the name “KANNO YUTA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NISSAN CHEMICAL IND LTD
11 patentsUS8815494B2Aug 26, 2014
Resist underlayer film forming composition containing silicon having anion group
NISSAN CHEMICAL IND LTD4 citations73
US10590219B2Mar 17, 2020
Retardation material-forming resin composition, orientation material, and retardation material
NISSAN CHEMICAL IND LTD2 citations72
US10100201B2Oct 16, 2018
Cured film formation composition, orientation material and retardation material
NISSAN CHEMICAL IND LTD2 citations72
US10081693B2Sep 25, 2018
Retardation material-forming resin composition, orientation material, and retardation material
NISSAN CHEMICAL IND LTD3 citations72
US10570248B2Feb 25, 2020
Cured film formation composition, orientation material, and retardation material
NISSAN CHEMICAL IND LTD1 citations62
US10372039B2Aug 6, 2019
Resist underlayer film forming composition containing silicon having ester group
NISSAN CHEMICAL IND LTD1 citations62
US11488824B2Nov 1, 2022
Method for manufacturing semiconductor device using silicon-containing resist underlayer film forming composition for solvent development
NISSAN CHEMICAL IND LTD0 citations52
US10428274B2Oct 1, 2019
Liquid crystal alignment agent for photo-alignment, aligning member, and retardation member
NISSAN CHEMICAL IND LTD0 citations41
US10079146B2Sep 18, 2018
Resist underlayer film forming composition containing silicon containing cyclic organic group having hetero atom
NISSAN CHEMICAL IND LTD0 citations41
US9494862B2Nov 15, 2016
Resist underlayer film forming composition containing silicon having sulfone structure and amine structure
NISSAN CHEMICAL IND LTD0 citations41
US9290623B2Mar 22, 2016
Composition for forming silicon-containing resist underlayer film having cyclic diester group
NISSAN CHEMICAL IND LTD0 citations41
NAKAJIMA MAKOTO
6 patentsUS9023588B2May 5, 2015
Resist underlayer film forming composition containing silicon having nitrogen-containing ring
NAKAJIMA MAKOTO8 citations83
US8426112B2Apr 23, 2013
Resist underlayer film forming composition containing polymer having nitrogen-containing silyl group
NAKAJIMA MAKOTO9 citations83
US9760006B2Sep 12, 2017
Silicon-containing resist underlayer film forming composition having urea group
NAKAJIMA MAKOTO5 citations72
US11392037B2Jul 19, 2022
Resist underlayer film forming composition containing silicone having cyclic amino group
NAKAJIMA MAKOTO0 citations51
US9093279B2Jul 28, 2015
Thin film forming composition for lithography containing titanium and silicon
NAKAJIMA MAKOTO1 citations51
US9524871B2Dec 20, 2016
Silicon-containing resist underlayer film-forming composition having sulfone structure
NAKAJIMA MAKOTO0 citations40
KANNO YUTA
4 patentsUS8828879B2Sep 9, 2014
Silicon-containing composition having sulfonamide group for forming resist underlayer film
KANNO YUTA4 citations71
US8877425B2Nov 4, 2014
Silicon-containing resist underlayer film forming composition having fluorine-based additive
KANNO YUTA3 citations57
US9291900B2Mar 22, 2016
Composition for forming resist underlayer film, containing silicon that bears diketone-structure-containing organic group
KANNO YUTA1 citations50
US9217921B2Dec 22, 2015
Resist underlayer film forming composition containing silicon having sulfide bond
KANNO YUTA0 citations40