Inventor
YOKOKAWA NATSUMI
JP22 patents
Patents
22 patentsUS9188865B2Nov 17, 2015
Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device
FUJIFILM CORP7 citations84
US9291898B2Mar 22, 2016
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin
FUJIFILM CORP8 citations83
US9291896B2Mar 22, 2016
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic device
FUJIFILM CORP8 citations83
US9798234B2Oct 24, 2017
Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo mask
FUJIFILM CORP4 citations73
US9527809B2Dec 27, 2016
Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device
FUJIFILM CORP6 citations73
US10120281B2Nov 6, 2018
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device
FUJIFILM CORP6 citations72
US9651863B2May 16, 2017
Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
FUJIFILM CORP2 citations72
US9423690B2Aug 23, 2016
Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the same
FUJIFILM CORP3 citations72
US9291897B2Mar 22, 2016
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device
FUJIFILM CORP3 citations72
US9223215B2Dec 29, 2015
Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin
FUJIFILM CORP2 citations63
US10444627B2Oct 15, 2019
Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device
FUJIFILM CORP1 citations62
US10945928B2Mar 16, 2021
Denture base coating composition, coating film-bearing denture base, plate denture, and method for producing coating film-bearing denture base
FUJIFILM CORP1 citations57
US9766547B2Sep 19, 2017
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device
FUJIFILM CORP1 citations52
US9500951B2Nov 22, 2016
Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device
FUJIFILM CORP0 citations52
US9904168B2Feb 27, 2018
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device
FUJIFILM CORP1 citations51
US12187025B2Jan 7, 2025
On-machine development type planographic printing plate precursor, method for preparing planographic printing plate, and planographic printing method
FUJIFILM CORP0 citations50
US12157296B2Dec 3, 2024
On-press development type lithographic printing plate precursor, method for preparing lithographic printing plate, and lithographic printing method
FUJIFILM CORP0 citations50
US11635701B2Apr 25, 2023
Planographic printing plate precursor, method of preparing planographic printing plate, and planographic printing method
FUJIFILM CORP0 citations50
US10526266B2Jan 7, 2020
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, electronic device, compound, and method for producing compound
FUJIFILM CORP0 citations41
US10324374B2Jun 18, 2019
Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compound
FUJIFILM CORP0 citations41
US10011576B2Jul 3, 2018
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound
FUJIFILM CORP0 citations41
US9551933B2Jan 24, 2017
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device
FUJIFILM CORP0 citations41