Inventor
NIHASHI WATARU
JP23 patents
Patents
23 patentsUS11156915B2Oct 26, 2021
Actinic ray-sensitive or radiation-sensitive composition, method for purifying actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP7 citations84
US9291896B2Mar 22, 2016
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic device
FUJIFILM CORP8 citations83
US9291898B2Mar 22, 2016
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin
FUJIFILM CORP8 citations83
US10788754B2Sep 29, 2020
Pattern forming method and electronic device manufacturing method
FUJIFILM CORP2 citations73
US10663864B2May 26, 2020
Pattern forming method, method for manufacturing electronic device, and laminate
FUJIFILM CORP4 citations73
US9527809B2Dec 27, 2016
Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device
FUJIFILM CORP6 citations73
US9651863B2May 16, 2017
Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
FUJIFILM CORP2 citations72
US9423690B2Aug 23, 2016
Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the same
FUJIFILM CORP3 citations72
US9291897B2Mar 22, 2016
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device
FUJIFILM CORP3 citations72
US12306538B2May 20, 2025
Treatment liquid and pattern forming method
FUJIFILM CORP0 citations62
US11042094B2Jun 22, 2021
Treatment liquid and pattern forming method
FUJIFILM CORP1 citations62
US10962884B2Mar 30, 2021
Treatment liquid and pattern forming method
FUJIFILM CORP0 citations62
US10890847B2Jan 12, 2021
Pattern forming method, resist pattern, method for manufacturing electronic device, and electronic device
FUJIFILM CORP1 citations62
US10761426B2Sep 1, 2020
Pattern forming method, method for manufacturing electronic device, and laminate
FUJIFILM CORP1 citations62
US10444627B2Oct 15, 2019
Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device
FUJIFILM CORP1 citations62
US11460769B2Oct 4, 2022
Actinic ray-sensitive or radiation-sensitive composition, method for producing actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP0 citations52
US10599038B2Mar 24, 2020
Rinsing liquid, pattern forming method, and electronic device manufacturing method
FUJIFILM CORP0 citations52
US10562991B2Feb 18, 2020
Developer, pattern forming method, and electronic device manufacturing method
FUJIFILM CORP0 citations52
US11640113B2May 2, 2023
Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device
FUJIFILM CORP0 citations51
US11573491B2Feb 7, 2023
Negative tone photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP0 citations51
US10095111B2Oct 9, 2018
Pattern forming method, method for manufacturing electronic device, and electronic device
FUJIFILM CORP1 citations51
US10394127B2Aug 27, 2019
Pattern forming method and method for manufacturing electronic device
FUJIFILM CORP0 citations41
US9551933B2Jan 24, 2017
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device
FUJIFILM CORP0 citations41