Inventor
MIYAZAKI KO
JP13 patents
⚠️ This page may combine multiple inventors who share the name “MIYAZAKI KO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
RENESAS TECH CORP
7 patentsUS6958292B2Oct 25, 2005
Method of manufacturing integrated circuit
RENESAS TECH CORP4 citations73
US7361530B2Apr 22, 2008
Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light
RENESAS TECH CORP3 citations63
US7205222B2Apr 17, 2007
Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light
RENESAS TECH CORP1 citations63
US6849540B2Feb 1, 2005
Method of fabricating semiconductor integrated circuit device and method of producing a multi-chip module that includes patterning with a photomask that uses metal for blocking exposure light and a photomask that uses organic resin for blocking exposure light
RENESAS TECH CORP2 citations63
US6936406B2Aug 30, 2005
Method of manufacturing integrated circuit
RENESAS TECH CORP2 citations62
US6902868B2Jun 7, 2005
Method of manufacturing integrated circuit
RENESAS TECH CORP3 citations62
US6794207B2Sep 21, 2004
Method of manufacturing integrated circuit
RENESAS TECH CORP3 citations62
HITACHI LTD
6 patentsUS6656644B2Dec 2, 2003
Manufacturing method of photomask and photomask
HITACHI LTD64 citations95
US6665858B2Dec 16, 2003
Manufacturing method of semiconductor device
HITACHI LTD31 citations92
US6596656B2Jul 22, 2003
Manufacturing use of photomasks with an opaque pattern comprising an organic layer photoabsorptive to exposure light with wavelengths exceeding 200 NM
HITACHI LTD11 citations74
US6846598B2Jan 25, 2005
Manufacturing method of photomask and photomask
HITACHI LTD6 citations73
US5159664AOct 27, 1992
Graphic display apparatus
HITACHI LTD15 citations70
US6622292B2Sep 16, 2003
Design method for logic circuit, design support system for logic circuit and readable media
HITACHI LTD4 citations56