Inventor
EBISUDANI TAISHI
JP6 patents
Patents
6 patentsUS10529554B2Jan 7, 2020
Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
ASM IP HOLDING BV377 citations97
US10580645B2Mar 3, 2020
Plasma enhanced atomic layer deposition (PEALD) of SiN using silicon-hydrohalide precursors
ASM IP HOLDING BV17 citations85
US10381219B1Aug 13, 2019
Methods for forming a silicon nitride film
ASM IP HOLDING BV17 citations82
US11676812B2Jun 13, 2023
Method for forming silicon nitride film selectively on top/bottom portions
ASM IP HOLDING BV1 citations60
US10720322B2Jul 21, 2020
Method for forming silicon nitride film selectively on top surface
ASM IP HOLDING BV1 citations60
US10707073B2Jul 7, 2020
Film forming method and patterning method
ASM IP HOLDING BV0 citations48