Inventor
KOHASHI TAKAHIRO
JP10 patents
Patents
10 patentsUS4191571AMar 4, 1980
Method of pattern forming in a photosensitive composition having a reciprocity law failing property
HITACHI LTD30 citations91
US4561169ADec 31, 1985
Method of manufacturing semiconductor device utilizing multilayer mask
HITACHI LTD17 citations73
US4465768AAug 14, 1984
Pattern-formation method with iodine containing azide and oxygen plasma etching of substrate
HITACHI LTD15 citations73
US4086090AApr 25, 1978
Formation of pattern using acrylamide-diacetoneacrylamide copolymer
HITACHI LTD14 citations73
US4469778ASep 4, 1984
Pattern formation method utilizing deep UV radiation and bisazide composition
HITACHI LTD13 citations72
US4241162ADec 23, 1980
Light sensitive photoresist materials
HITACHI LTD15 citations72
US4614706ASep 30, 1986
Method of forming a microscopic pattern with far UV pattern exposure, alkaline solution development, and dry etching
HITACHI LTD16 citations71
US4409313AOct 11, 1983
Powder deposition to form pattern on light imaged photosensitive diazonium salt coating having salt of aromatic amine
HITACHI LTD4 citations62
US4377630AMar 22, 1983
Photosensitive composition
HITACHI LTD2 citations62
US4520094AMay 28, 1985
Process for forming powder pattern on light exposed layer having photosensitive diazonium salts
HITACHI LTD1 citations51