Inventor
HEO TAE-YEOL
KR6 patents
Patents
6 patentsUS6552337B1Apr 22, 2003
Methods and systems for measuring microroughness of a substrate combining particle counter and atomic force microscope measurements
SAMSUNG ELECTRONICS CO LTD31 citations90
US6724474B1Apr 20, 2004
Wafer surface inspection method
SAMSUNG ELECTRONICS CO LTD17 citations78
US7258931B2Aug 21, 2007
Semiconductor wafers having asymmetric edge profiles that facilitate high yield processing by inhibiting particulate contamination
SAMSUNG ELECTRONICS CO LTD7 citations69
US5972863AOct 26, 1999
Slurry compositions for polishing wafers used in integrated circuit devices and cleaning compositions for removing electron wax after polishing
SAMSUNG ELECTRONICS CO LTD5 citations62
US6252228B1Jun 26, 2001
Method of analyzing morphology of bulk defect and surface defect on semiconductor wafer
SAMSUNG ELECTRONICS CO LTD3 citations61
US6919214B2Jul 19, 2005
Apparatus for analyzing a substrate employing a copper decoration
SAMSUNG ELECTRONICS CO LTD0 citations46