Inventor
BYUN KYUNG-EUN
KR57 patents
Patents
50 patentsUS11682622B2Jun 20, 2023
Interconnect structure having nanocrystalline graphene cap layer and electronic device including the interconnect structure
SAMSUNG ELECTRONICS CO LTD5 citations86
US9306005B2Apr 5, 2016
Electronic device including graphene
SAMSUNG ELECTRONICS CO LTD10 citations84
US9105556B2Aug 11, 2015
Tunneling field-effect transistor including graphene channel
SAMSUNG ELECTRONICS CO LTD11 citations84
US9053932B2Jun 9, 2015
Methods of preparing graphene and device including graphene
SAMSUNG ELECTRONICS CO LTD10 citations84
US9040957B2May 26, 2015
Field effect transistor using graphene
SAMSUNG ELECTRONICS CO LTD8 citations84
US11626282B2Apr 11, 2023
Graphene structure and method of forming graphene structure
SAMSUNG ELECTRONICS CO LTD2 citations73
US11217531B2Jan 4, 2022
Interconnect structure having nanocrystalline graphene cap layer and electronic device including the interconnect structure
SAMSUNG ELECTRONICS CO LTD2 citations73
US11069619B2Jul 20, 2021
Interconnect structure and electronic device employing the same
SAMSUNG ELECTRONICS CO LTD3 citations73
US10971451B2Apr 6, 2021
Interconnect structure having nanocrystalline graphene cap layer and electronic device including the interconnect structure
SAMSUNG ELECTRONICS CO LTD2 citations73
US10587207B2Mar 10, 2020
Triboelectric generator using surface plasmon resonance
SAMSUNG ELECTRONICS CO LTD5 citations73
US10014799B2Jul 3, 2018
Triboelectric generator
SAMSUNG ELECTRONICS CO LTD5 citations73
US10850985B2Dec 1, 2020
Method of forming nanocrystalline graphene, and device including nanocrystalline graphene
SAMSUNG ELECTRONICS CO LTD3 citations72
US9752941B2Sep 5, 2017
Pressure sensor and pressure sensing method
SAMSUNG ELECTRONICS CO LTD5 citations71
US11708633B2Jul 25, 2023
Metal chalcogenide film and method and device for manufacturing the same
SAMSUNG ELECTRONICS CO LTD3 citations69
US9166062B2Oct 20, 2015
Field effect transistor using graphene
SAMSUNG ELECTRONICS CO LTD2 citations63
US9048310B2Jun 2, 2015
Graphene switching device having tunable barrier
SAMSUNG ELECTRONICS CO LTD2 citations63
US12593449B2Mar 31, 2026
Vertical nonvolatile memory device including gate electrodes with metal-doped graphene
SAMSUNG ELECTRONICS CO LTD0 citations62
US12506074B2Dec 23, 2025
Interconnect structure to reduce contact resistance, electronic device including the same, and method of manufacturing the interconnect structure
SAMSUNG ELECTRONICS CO LTD0 citations62
US12389630B2Aug 12, 2025
Vertical channel transistor including a graphene insertion layer beweeen a source/drain electrode and a channel pattern
SAMSUNG ELECTRONICS CO LTD0 citations62
US12378120B2Aug 5, 2025
Wiring including graphene layer and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US12369359B2Jul 22, 2025
Thin film structure and electronic device including two-dimensional material
SAMSUNG ELECTRONICS CO LTD0 citations62
US12359911B2Jul 15, 2025
Method of calculating thickness of graphene layer and method of measuring content of silicon carbide by using XPS
SAMSUNG ELECTRONICS CO LTD0 citations62
US12341063B2Jun 24, 2025
Interconnect structure, electronic device including the same, and method of manufacturing interconnect structure
SAMSUNG ELECTRONICS CO LTD0 citations62
US12262527B2Mar 25, 2025
Vertical-channel cell array transistor structure and dram device including the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US12217958B2Feb 4, 2025
Method of pre-treating substrate and method of directly forming graphene using the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US12183780B2Dec 31, 2024
Metal-to-semiconductor contact including a 2D crystal material layer
SAMSUNG ELECTRONICS CO LTD0 citations62
US12183783B2Dec 31, 2024
Stacked structure including two-dimensional material and method of fabricating the stacked structure
SAMSUNG ELECTRONICS CO LTD0 citations62
US12080595B2Sep 3, 2024
Method of forming interconnect structure
SAMSUNG ELECTRONICS CO LTD0 citations62
US12046656B2Jul 23, 2024
Semiconductor device including surface-treated semiconductor layer
SAMSUNG ELECTRONICS CO LTD0 citations62
US11906291B2Feb 20, 2024
Method of calculating thickness of graphene layer and method of measuring content of silicon carbide by using XPS
SAMSUNG ELECTRONICS CO LTD0 citations62
US11713248B2Aug 1, 2023
Method of growing graphene selectively
SAMSUNG ELECTRONICS CO LTD0 citations62
US11626502B2Apr 11, 2023
Interconnect structure to reduce contact resistance, electronic device including the same, and method of manufacturing the interconnect structure
SAMSUNG ELECTRONICS CO LTD1 citations62
US11094538B2Aug 17, 2021
Method of forming graphene
SAMSUNG ELECTRONICS CO LTD1 citations62
US9306021B2Apr 5, 2016
Graphene devices and methods of fabricating the same
SAMSUNG ELECTRONICS CO LTD2 citations62
US12421598B2Sep 23, 2025
Nanocrystalline graphene and method of forming nanocrystalline graphene
SAMSUNG ELECTRONICS CO LTD0 citations61
US12400975B2Aug 26, 2025
Interconnect structure and electronic device including the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US12080649B2Sep 3, 2024
Semiconductor memory device and apparatus including the same
SAMSUNG ELECTRONICS CO LTD1 citations61
US11424186B2Aug 23, 2022
Semiconductor memory device and apparatus including the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US12575136B2Mar 10, 2026
Transistor
SAMSUNG ELECTRONICS CO LTD0 citations60
US12336259B2Jun 17, 2025
Electronic device including two-dimensional material and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD0 citations60
US11887849B2Jan 30, 2024
Method of forming transition metal dichalcogenidethin film and method of manufacturing electronic device including the same
SAMSUNG ELECTRONICS CO LTD0 citations60
US11869768B2Jan 9, 2024
Method of forming transition metal dichalcogenide thin film
SAMSUNG ELECTRONICS CO LTD0 citations60
US11545358B2Jan 3, 2023
Method of forming transition metal dichalcogenide thin film
SAMSUNG ELECTRONICS CO LTD1 citations60
US12334357B2Jun 17, 2025
Method of forming material layer
SAMSUNG ELECTRONICS CO LTD0 citations59
US12297532B2May 13, 2025
Metal chalcogenide film and method and device for manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations59
US11881399B2Jan 23, 2024
Method of forming transition metal dichalcogenide thin film
SAMSUNG ELECTRONICS CO LTD0 citations59
US11476117B2Oct 18, 2022
Method of forming transition metal dichalcogenide thin film
SAMSUNG ELECTRONICS CO LTD0 citations59
US11538810B2Dec 27, 2022
Wiring structures, methods of forming the same, and semiconductor devices including the same
SAMSUNG ELECTRONICS CO LTD0 citations55
US11975971B2May 7, 2024
Methods of forming graphene and graphene manufacturing apparatuses
SAMSUNG ELECTRONICS CO LTD0 citations52
US11572278B2Feb 7, 2023
Method of forming graphene
SAMSUNG ELECTRONICS CO LTD0 citations52
Showing the top 50 of 57 patents by PatentIndex Score.