P

Inventor

BYUN KYUNG-EUN

KR57 patents

Patents

50 patents
US11682622B2Jun 20, 2023

Interconnect structure having nanocrystalline graphene cap layer and electronic device including the interconnect structure

SAMSUNG ELECTRONICS CO LTD5 citations86
US9306005B2Apr 5, 2016

Electronic device including graphene

SAMSUNG ELECTRONICS CO LTD10 citations84
US9105556B2Aug 11, 2015

Tunneling field-effect transistor including graphene channel

SAMSUNG ELECTRONICS CO LTD11 citations84
US9053932B2Jun 9, 2015

Methods of preparing graphene and device including graphene

SAMSUNG ELECTRONICS CO LTD10 citations84
US9040957B2May 26, 2015

Field effect transistor using graphene

SAMSUNG ELECTRONICS CO LTD8 citations84
US11626282B2Apr 11, 2023

Graphene structure and method of forming graphene structure

SAMSUNG ELECTRONICS CO LTD2 citations73
US11217531B2Jan 4, 2022

Interconnect structure having nanocrystalline graphene cap layer and electronic device including the interconnect structure

SAMSUNG ELECTRONICS CO LTD2 citations73
US11069619B2Jul 20, 2021

Interconnect structure and electronic device employing the same

SAMSUNG ELECTRONICS CO LTD3 citations73
US10971451B2Apr 6, 2021

Interconnect structure having nanocrystalline graphene cap layer and electronic device including the interconnect structure

SAMSUNG ELECTRONICS CO LTD2 citations73
US10587207B2Mar 10, 2020

Triboelectric generator using surface plasmon resonance

SAMSUNG ELECTRONICS CO LTD5 citations73
US10014799B2Jul 3, 2018

Triboelectric generator

SAMSUNG ELECTRONICS CO LTD5 citations73
US10850985B2Dec 1, 2020

Method of forming nanocrystalline graphene, and device including nanocrystalline graphene

SAMSUNG ELECTRONICS CO LTD3 citations72
US9752941B2Sep 5, 2017

Pressure sensor and pressure sensing method

SAMSUNG ELECTRONICS CO LTD5 citations71
US11708633B2Jul 25, 2023

Metal chalcogenide film and method and device for manufacturing the same

SAMSUNG ELECTRONICS CO LTD3 citations69
US9166062B2Oct 20, 2015

Field effect transistor using graphene

SAMSUNG ELECTRONICS CO LTD2 citations63
US9048310B2Jun 2, 2015

Graphene switching device having tunable barrier

SAMSUNG ELECTRONICS CO LTD2 citations63
US12593449B2Mar 31, 2026

Vertical nonvolatile memory device including gate electrodes with metal-doped graphene

SAMSUNG ELECTRONICS CO LTD0 citations62
US12506074B2Dec 23, 2025

Interconnect structure to reduce contact resistance, electronic device including the same, and method of manufacturing the interconnect structure

SAMSUNG ELECTRONICS CO LTD0 citations62
US12389630B2Aug 12, 2025

Vertical channel transistor including a graphene insertion layer beweeen a source/drain electrode and a channel pattern

SAMSUNG ELECTRONICS CO LTD0 citations62
US12378120B2Aug 5, 2025

Wiring including graphene layer and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US12369359B2Jul 22, 2025

Thin film structure and electronic device including two-dimensional material

SAMSUNG ELECTRONICS CO LTD0 citations62
US12359911B2Jul 15, 2025

Method of calculating thickness of graphene layer and method of measuring content of silicon carbide by using XPS

SAMSUNG ELECTRONICS CO LTD0 citations62
US12341063B2Jun 24, 2025

Interconnect structure, electronic device including the same, and method of manufacturing interconnect structure

SAMSUNG ELECTRONICS CO LTD0 citations62
US12262527B2Mar 25, 2025

Vertical-channel cell array transistor structure and dram device including the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US12217958B2Feb 4, 2025

Method of pre-treating substrate and method of directly forming graphene using the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US12183780B2Dec 31, 2024

Metal-to-semiconductor contact including a 2D crystal material layer

SAMSUNG ELECTRONICS CO LTD0 citations62
US12183783B2Dec 31, 2024

Stacked structure including two-dimensional material and method of fabricating the stacked structure

SAMSUNG ELECTRONICS CO LTD0 citations62
US12080595B2Sep 3, 2024

Method of forming interconnect structure

SAMSUNG ELECTRONICS CO LTD0 citations62
US12046656B2Jul 23, 2024

Semiconductor device including surface-treated semiconductor layer

SAMSUNG ELECTRONICS CO LTD0 citations62
US11906291B2Feb 20, 2024

Method of calculating thickness of graphene layer and method of measuring content of silicon carbide by using XPS

SAMSUNG ELECTRONICS CO LTD0 citations62
US11713248B2Aug 1, 2023

Method of growing graphene selectively

SAMSUNG ELECTRONICS CO LTD0 citations62
US11626502B2Apr 11, 2023

Interconnect structure to reduce contact resistance, electronic device including the same, and method of manufacturing the interconnect structure

SAMSUNG ELECTRONICS CO LTD1 citations62
US11094538B2Aug 17, 2021

Method of forming graphene

SAMSUNG ELECTRONICS CO LTD1 citations62
US9306021B2Apr 5, 2016

Graphene devices and methods of fabricating the same

SAMSUNG ELECTRONICS CO LTD2 citations62
US12421598B2Sep 23, 2025

Nanocrystalline graphene and method of forming nanocrystalline graphene

SAMSUNG ELECTRONICS CO LTD0 citations61
US12400975B2Aug 26, 2025

Interconnect structure and electronic device including the same

SAMSUNG ELECTRONICS CO LTD0 citations61
US12080649B2Sep 3, 2024

Semiconductor memory device and apparatus including the same

SAMSUNG ELECTRONICS CO LTD1 citations61
US11424186B2Aug 23, 2022

Semiconductor memory device and apparatus including the same

SAMSUNG ELECTRONICS CO LTD0 citations61
US12575136B2Mar 10, 2026

Transistor

SAMSUNG ELECTRONICS CO LTD0 citations60
US12336259B2Jun 17, 2025

Electronic device including two-dimensional material and method of fabricating the same

SAMSUNG ELECTRONICS CO LTD0 citations60
US11887849B2Jan 30, 2024

Method of forming transition metal dichalcogenidethin film and method of manufacturing electronic device including the same

SAMSUNG ELECTRONICS CO LTD0 citations60
US11869768B2Jan 9, 2024

Method of forming transition metal dichalcogenide thin film

SAMSUNG ELECTRONICS CO LTD0 citations60
US11545358B2Jan 3, 2023

Method of forming transition metal dichalcogenide thin film

SAMSUNG ELECTRONICS CO LTD1 citations60
US12334357B2Jun 17, 2025

Method of forming material layer

SAMSUNG ELECTRONICS CO LTD0 citations59
US12297532B2May 13, 2025

Metal chalcogenide film and method and device for manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations59
US11881399B2Jan 23, 2024

Method of forming transition metal dichalcogenide thin film

SAMSUNG ELECTRONICS CO LTD0 citations59
US11476117B2Oct 18, 2022

Method of forming transition metal dichalcogenide thin film

SAMSUNG ELECTRONICS CO LTD0 citations59
US11538810B2Dec 27, 2022

Wiring structures, methods of forming the same, and semiconductor devices including the same

SAMSUNG ELECTRONICS CO LTD0 citations55
US11975971B2May 7, 2024

Methods of forming graphene and graphene manufacturing apparatuses

SAMSUNG ELECTRONICS CO LTD0 citations52
US11572278B2Feb 7, 2023

Method of forming graphene

SAMSUNG ELECTRONICS CO LTD0 citations52

Showing the top 50 of 57 patents by PatentIndex Score.