Inventor

GOUSEV EVGENI

US42 patents

⚠️ This page may combine multiple inventors who share the name “GOUSEV EVGENI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GOUSEV EVGENI

QUALCOMM INC

Semiconductor device with via bar

Low power data generation for iris-related detection and authentication

Implementation of the focal plane 2D APD array for hyperion lidar system

Single-processor computer vision hardware control and application execution

Low-power always-on face detection, tracking, recognition and/or analysis using events-based vision sensor

Low-power always-on face detection, tracking, recognition and/or analysis using events-based vision sensor

Hybrid scanning lidar systems

Low-power iris scan initialization

Implementation of the focal plane 2D APD array for hyperion Lidar system

Optical character detection using a low-power sensor

Light source modulation for iris size adjustment

Voltage regulation integrated circuit (IC) with circuit components in an integrated three-dimensional (3D) inductor core and related methods of fabrication

Image sensor system

Cover-glass optical isolation for optical touch and fingerprint sensing

IBM

Formation of fully silicided metal gate using dual self-aligned silicide process

Complementary metal oxide semiconductor (CMOS) gate stack with high dielectric constant gate dielectric and integrated diffusion barrier

Thermally stable poly-Si/high dielectric constant material interfaces

Gate dielectric with self forming diffusion barrier

Complementary metal oxide semiconductor (CMOS) gate stack with high dielectric constant gate dielectric and integrated diffusion barrier

Method for forming heavy nitrogen-doped ultra thin oxynitride gate dielectrics

Thin germanium oxynitride gate dielectric for germanium-based devices

Formation of fully silicided metal gate using dual self-aligned silicide process

Formation of ultra-thin oxide layers by self-limiting interfacial oxidation

Method for etching chemically inert metal oxides

Method of forming uniform ultra-thin oxynitride layers

Method of fabricating a nitrided silicon oxide gate dielectric layer

QUALCOMM MEMS TECHNOLOGIES INC

Interferometric optical display system with broadband characteristics

Selective etching of MEMS using gaseous halides and reactive co-etchants

Electrode and interconnect materials for MEMS devices

Electrode and interconnect materials for MEMS devices

MEMS cavity-coating layers and methods

Capacitive MEMS device with programmable offset voltage control

Capacitive MEMS device with programmable offset voltage control

Electromechanical device treatment with water vapor

ALAM KHURSHID SYED

Equipment and methods for etching of MEMS

LONDERGAN ANA R

MEMS cavity-coating layers and methods

BITA ION

Etching processes used in MEMS production

LAN JE-HSIUNG

Two-terminal variable capacitance MEMS device

GOUSEV EVGENI

Interferometric optical display system with broadband characteristics

ANDREONI WANDA

Method of forming metal/high-κ gate stacks with high mobility

TU THANH NGHIA

Eliminate release etch attack by interface modification in sacrificial layers

NATARAJAN BANGALORE R

Display device with desiccant