P

Inventor

HARADA YUJI

JP146 patents
⚠️ This page may combine multiple inventors who share the name “HARADA YUJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHINETSU CHEMICAL CO

26 patents
US7537880B2May 26, 2009

Polymer, resist composition, and patterning process

SHINETSU CHEMICAL CO258 citations99
US7670750B2Mar 2, 2010

Polymer, resist protective coating material, and patterning process

SHINETSU CHEMICAL CO65 citations98
US7598016B2Oct 6, 2009

Resist composition and patterning process

SHINETSU CHEMICAL CO107 citations98
US7455952B2Nov 25, 2008

Patterning process and resist overcoat material

SHINETSU CHEMICAL CO63 citations98
US7771914B2Aug 10, 2010

Resist composition and patterning process

SHINETSU CHEMICAL CO90 citations97
US7771913B2Aug 10, 2010

Resist composition and patterning process using the same

SHINETSU CHEMICAL CO55 citations94
US7759047B2Jul 20, 2010

Resist protective film composition and patterning process

SHINETSU CHEMICAL CO33 citations93
US7642034B2Jan 5, 2010

Polymer, resist protective coating material, and patterning process

SHINETSU CHEMICAL CO22 citations93
US7622242B2Nov 24, 2009

Resist composition and patterning process

SHINETSU CHEMICAL CO25 citations93
US6878501B2Apr 12, 2005

Polymer, chemically amplified resist composition and patterning process

SHINETSU CHEMICAL CO31 citations93
US6875556B2Apr 5, 2005

Resist compositions and patterning process

SHINETSU CHEMICAL CO20 citations93
US6710148B2Mar 23, 2004

Polymers, resist compositions and patterning process

SHINETSU CHEMICAL CO20 citations93
US6579658B2Jun 17, 2003

Polymers, resist compositions and patterning process

SHINETSU CHEMICAL CO29 citations93
US6511787B2Jan 28, 2003

Polymers, resist compositions and patterning process

SHINETSU CHEMICAL CO25 citations93
US7514204B2Apr 7, 2009

Resist composition and patterning process

SHINETSU CHEMICAL CO40 citations92
US7332616B2Feb 19, 2008

Polymerizable compound, polymer, positive-resist composition, and patterning process using the same

SHINETSU CHEMICAL CO9 citations84
US6872514B2Mar 29, 2005

Polymers, resist compositions and patterning process

SHINETSU CHEMICAL CO13 citations84
US6835524B2Dec 28, 2004

Polymers, chemical amplification resist compositions and patterning process

SHINETSU CHEMICAL CO15 citations84
US6790591B2Sep 14, 2004

Polymers, resist compositions and patterning process

SHINETSU CHEMICAL CO15 citations84
US6582880B2Jun 24, 2003

Polymers, resist compositions and patterning process

SHINETSU CHEMICAL CO14 citations84
US6461789B1Oct 8, 2002

Polymers, chemical amplification resist compositions and patterning process

SHINETSU CHEMICAL CO14 citations84
US6461791B1Oct 8, 2002

Polymers, chemical amplification resist compositions and patterning process

SHINETSU CHEMICAL CO20 citations84
US6436606B1Aug 20, 2002

Polymers, resist compositions and patterning process

SHINETSU CHEMICAL CO17 citations84
US6864037B2Mar 8, 2005

Polymers, resist compositions and patterning process

SHINETSU CHEMICAL CO11 citations74
US6824955B2Nov 30, 2004

Polymers, resist compositions and patterning process

SHINETSU CHEMICAL CO7 citations74
US6369279B1Apr 9, 2002

Styrene derivatives

SHINETSU CHEMICAL CO12 citations74

CANON KK

7 patents

HARADA YUJI

6 patents

CENTRAL GLASS CO LTD

5 patents

MAZDA MOTOR

2 patents

HATAKEYAMA JUN

1 patent

PANASONIC CORP

1 patent

WATANABE TAKERU

1 patent

TOYO MACHINERY & METAL

1 patent

Showing the top 50 of 146 patents by PatentIndex Score.