Inventor
DENG SHAOREN
BE18 patents
⚠️ This page may combine multiple inventors who share the name “DENG SHAOREN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASM IP HOLDING BV
17 patentsUS11094535B2Aug 17, 2021
Selective passivation and selective deposition
ASM IP HOLDING BV20 citations93
US11643720B2May 9, 2023
Selective deposition of silicon oxide on metal surfaces
ASM IP HOLDING BV6 citations85
US11450529B2Sep 20, 2022
Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface
ASM IP HOLDING BV9 citations85
US11145506B2Oct 12, 2021
Selective passivation and selective deposition
ASM IP HOLDING BV12 citations84
US11965238B2Apr 23, 2024
Selective deposition of metal oxides on metal surfaces
ASM IP HOLDING BV3 citations74
US11898240B2Feb 13, 2024
Selective deposition of silicon oxide on dielectric surfaces relative to metal surfaces
ASM IP HOLDING BV4 citations74
US11915929B2Feb 27, 2024
Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface
ASM IP HOLDING BV2 citations73
US11830732B2Nov 28, 2023
Selective passivation and selective deposition
ASM IP HOLDING BV2 citations72
US12571093B2Mar 10, 2026
Selective deposition of silicon oxide on metal surfaces
ASM IP HOLDING BV0 citations62
US12482648B2Nov 25, 2025
Selective passivation and selective deposition
ASM IP HOLDING BV0 citations62
US12170197B2Dec 17, 2024
Selective passivation and selective deposition
ASM IP HOLDING BV0 citations62
US12136552B2Nov 5, 2024
Toposelective vapor deposition using an inhibitor
ASM IP HOLDING BV1 citations62
US12322593B2Jun 3, 2025
Selective passivation and selective deposition
ASM IP HOLDING BV0 citations61
US12217954B2Feb 4, 2025
Method of cleaning a surface
ASM IP HOLDING BV0 citations60
US12476106B2Nov 18, 2025
Selective deposition of organic material
ASM IP HOLDING BV0 citations59
US12227835B2Feb 18, 2025
Selective deposition of material comprising silicon and oxygen using plasma
ASM IP HOLDING BV0 citations58
US12454752B2Oct 28, 2025
Method and apparatus for forming a patterned structure on a substrate
ASM IP HOLDING BV0 citations57