Inventor
HYAKUTAKE HIRONOBU
JP16 patents
⚠️ This page may combine multiple inventors who share the name “HYAKUTAKE HIRONOBU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
11 patentsUS6203627B1Mar 20, 2001
Cleaning method
TOKYO ELECTRON LTD18 citations92
US6293288B2Sep 25, 2001
Cleaning method and apparatus
TOKYO ELECTRON LTD7 citations73
US11232959B2Jan 25, 2022
Substrate processing apparatus and substrate processing meihod
TOKYO ELECTRON LTD4 citations69
US12575350B2Mar 10, 2026
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations61
US11087992B2Aug 10, 2021
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD1 citations61
US11075096B2Jul 27, 2021
Substrate processing apparatus
TOKYO ELECTRON LTD1 citations61
US11915947B2Feb 27, 2024
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations59
US10840081B2Nov 17, 2020
Liquid processing apparatus, liquid processing method, and storage medium
TOKYO ELECTRON LTD1 citations56
US10916456B2Feb 9, 2021
Substrate liquid processing apparatus and substrate liquid processing method
TOKYO ELECTRON LTD0 citations50
US10928732B2Feb 23, 2021
Substrate liquid processing apparatus, substrate liquid processing method, and storage medium
TOKYO ELECTRON LTD0 citations44
US10458010B2Oct 29, 2019
Substrate liquid processing apparatus, substrate liquid processing method, and storage medium
TOKYO ELECTRON LTD0 citations34
HYAKUTAKE HIRONOBU
3 patentsUS9027573B2May 12, 2015
Substrate processing apparatus for maintaining a more uniform temperature during substrate processing
HYAKUTAKE HIRONOBU5 citations69
US8685169B2Apr 1, 2014
Substrate processing apparatus, substrate processing method and storage medium
HYAKUTAKE HIRONOBU1 citations44
US8882961B2Nov 11, 2014
Substrate treatment apparatus
HYAKUTAKE HIRONOBU0 citations33