Inventor
JIAN GUOQIANG
US10 patents
Patents
10 patentsUS10199230B2Feb 5, 2019
Methods for selective deposition of metal silicides via atomic layer deposition cycles
APPLIED MATERIALS INC3 citations72
US9947578B2Apr 17, 2018
Methods for forming low-resistance contacts through integrated process flow systems
APPLIED MATERIALS INC2 citations72
US9595466B2Mar 14, 2017
Methods for etching via atomic layer deposition (ALD) cycles
APPLIED MATERIALS INC2 citations72
US11384432B2Jul 12, 2022
Atomic layer deposition chamber with funnel-shaped gas dispersion channel and gas distribution plate
APPLIED MATERIALS INC5 citations71
US10643840B2May 5, 2020
Selective deposition defects removal by chemical etch
APPLIED MATERIALS INC2 citations70
US11018009B2May 25, 2021
Tuning work function of p-metal work function films through vapor deposition
APPLIED MATERIALS INC0 citations62
US11932939B2Mar 19, 2024
Lids and lid assembly kits for atomic layer deposition chambers
APPLIED MATERIALS INC0 citations60
US11355391B2Jun 7, 2022
Method for forming a metal gapfill
APPLIED MATERIALS INC0 citations60
US10879081B2Dec 29, 2020
Methods of reducing or eliminating defects in tungsten film
APPLIED MATERIALS INC0 citations51
US10755947B2Aug 25, 2020
Methods of increasing selectivity for selective etch processes
APPLIED MATERIALS INC0 citations50