Inventor
PARK JIN HYUNG
KR34 patents
⚠️ This page may combine multiple inventors who share the name “PARK JIN HYUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SK INNOVATION CO LTD
11 patentsUS10815378B2Oct 27, 2020
Polyamic acid resin and polyamideimide film
SK INNOVATION CO LTD10 citations83
US10370496B2Aug 6, 2019
Polyamic acid resin and polyamideimide film
SK INNOVATION CO LTD4 citations72
US10316145B2Jun 11, 2019
Polyamic acid composition, polyamideimide film thereof and method for preparing polyamideimide film
SK INNOVATION CO LTD3 citations72
US10370495B2Aug 6, 2019
Polyamic acid resin, polyamideimide film, and method for preparing the same
SK INNOVATION CO LTD1 citations61
US11814491B2Nov 14, 2023
Transparent film, optical material comprising the same, and display device comprising the same
SK INNOVATION CO LTD0 citations59
US12258306B2Mar 25, 2025
Diamine, polymer and film produced using the same
SK INNOVATION CO LTD0 citations51
US11970579B2Apr 30, 2024
Polyamic acid resin and polyamideimide film
SK INNOVATION CO LTD0 citations51
US11279113B2Mar 22, 2022
Method for preparing polymer film
SK INNOVATION CO LTD0 citations51
US12180144B2Dec 31, 2024
Diamine compound, polyimide precursor and polyimide prepared by using the same, composition for forming polyimide film and polyimide film prepared by using the same, and uses thereof
SK INNOVATION CO LTD0 citations50
US11318722B2May 3, 2022
Method for manufacturing polymer film
SK INNOVATION CO LTD0 citations50
US11921546B2Mar 5, 2024
Polyimide film and flexible display panel including the same
SK INNOVATION CO LTD0 citations48
SAMSUNG ELECTRONICS CO LTD
8 patentsUS9391138B2Jul 12, 2016
Semiconductor devices including empty spaces and methods of forming the same
SAMSUNG ELECTRONICS CO LTD8 citations82
US7563547B2Jul 21, 2009
Photomask and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD17 citations82
US10470633B2Nov 12, 2019
Cleaning device
SAMSUNG ELECTRONICS CO LTD2 citations71
US9757000B2Sep 12, 2017
Cleaning device
SAMSUNG ELECTRONICS CO LTD3 citations71
US12408323B2Sep 2, 2025
Semiconductor memory device and method for manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations56
US7387965B2Jun 17, 2008
Reference pattern for creating a defect recognition level, method of fabricating the same and method of inspecting defects using the same
SAMSUNG ELECTRONICS CO LTD1 citations52
US9953928B2Apr 24, 2018
Semiconductor devices including empty spaces
SAMSUNG ELECTRONICS CO LTD0 citations50
US7084950B2Aug 1, 2006
Chromeless photomask and exposure apparatus including the chromeless photomask
SAMSUNG ELECTRONICS CO LTD0 citations41
APPLE INC
3 patentsUBMATERIALS INC
3 patentsUS9834705B2Dec 5, 2017
Polishing slurry and method of polishing substrate using the same
UBMATERIALS INC1 citations51
US9758698B2Sep 12, 2017
Polishing slurry and substrate polishing method using the same
UBMATERIALS INC0 citations51
US9790401B2Oct 17, 2017
Abrasive particles, polishing slurry and method of fabricating abrasive particles
UBMATERIALS INC0 citations40
SAMSUNG DISPLAY CO LTD
2 patentsUS9982165B2May 29, 2018
Polishing slurry for silicon, method of polishing polysilicon and method of manufacturing a thin film transistor substrate
SAMSUNG DISPLAY CO LTD2 citations71
US12113077B2Oct 8, 2024
Polishing slurry, method for manufacturing a display device using the same and display device
SAMSUNG DISPLAY CO LTD0 citations59