P

Inventor

DAO GIANG T

US22 patents
⚠️ This page may combine multiple inventors who share the name “DAO GIANG T”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

INTEL CORP

21 patents
US5635316AJun 3, 1997

Layout methodology, mask set, and patterning method for phase-shifting lithography

INTEL CORP106 citations99
US5620816AApr 15, 1997

Layout methodology, mask set, and patterning method for phase-shifting lithography

INTEL CORP109 citations99
US5595843AJan 21, 1997

Layout methodology, mask set, and patterning method for phase-shifting lithography

INTEL CORP100 citations99
US5881125AMar 9, 1999

Attenuated phase-shifted reticle using sub-resolution pattern

INTEL CORP61 citations96
US6715495B2Apr 6, 2004

Reduced particle contamination manufacturing and packaging for reticles

INTEL CORP37 citations95
US6279249B1Aug 28, 2001

Reduced particle contamination manufacturing and packaging for reticles

INTEL CORP44 citations95
US5446521AAug 29, 1995

Phase-shifted opaquing ring

INTEL CORP70 citations95
US5302477AApr 12, 1994

Inverted phase-shifted reticle

INTEL CORP195 citations95
US5384219AJan 24, 1995

Reticle with structurally identical inverted phase-shifted features

INTEL CORP56 citations93
US6763608B2Jul 20, 2004

Method of transporting a reticle

INTEL CORP23 citations92
US6732746B2May 11, 2004

Reduced particle contamination manufacturing and packaging for reticles

INTEL CORP13 citations92
US5789118AAug 4, 1998

Method and apparatus for precision determination of phase-shift in a phase-shifted reticle

INTEL CORP53 citations92
US5618643AApr 8, 1997

Embedded phase shifting mask with improved relative attenuated film transmission

INTEL CORP21 citations92
US5348826ASep 20, 1994

Reticle with structurally identical inverted phase-shifted features

INTEL CORP25 citations91
US5700602ADec 23, 1997

Method and apparatus for precision determination of phase-shift in a phase-shifted reticle

INTEL CORP29 citations89
US5633102AMay 27, 1997

Lithography using a new phase-shifting reticle

INTEL CORP25 citations89
US5354632AOct 11, 1994

Lithography using a phase-shifting reticle with reduced transmittance

INTEL CORP43 citations89
US5300379AApr 5, 1994

Method of fabrication of inverted phase-shifted reticle

INTEL CORP41 citations88
US5688409ANov 18, 1997

Processes for fabricating device layers with ultrafine features

INTEL CORP14 citations71
US6569582B2May 27, 2003

Hinged pellicles and methods of use

INTEL CORP5 citations58
US7368020B2May 6, 2008

Reduced particle contamination manufacturing and packaging for reticles

INTEL CORP0 citations51

INOSO LLC

1 patent