Inventor
FILIPIAK STANLEY M
US20 patents
⚠️ This page may combine multiple inventors who share the name “FILIPIAK STANLEY M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MOTOROLA INC
13 patentsUS6174810B1Jan 16, 2001
Copper interconnect structure and method of formation
MOTOROLA INC235 citations98
US5447887ASep 5, 1995
Method for capping copper in semiconductor devices
MOTOROLA INC312 citations98
US5188979AFeb 23, 1993
Method for forming a nitride layer using preheated ammonia
MOTOROLA INC69 citations96
US5918147AJun 29, 1999
Process for forming a semiconductor device with an antireflective layer
MOTOROLA INC89 citations95
US5358901AOct 25, 1994
Process for forming an intermetallic layer
MOTOROLA INC53 citations95
US5126283AJun 30, 1992
Process for the selective encapsulation of an electrically conductive structure in a semiconductor device
MOTOROLA INC68 citations95
US6287951B1Sep 11, 2001
Process for forming a combination hardmask and antireflective layer
MOTOROLA INC164 citations93
US6686633B1Feb 3, 2004
Semiconductor device, memory cell, and processes for forming them
MOTOROLA INC16 citations91
US6184073B1Feb 6, 2001
Process for forming a semiconductor device having an interconnect or conductive film electrically insulated from a conductive member or region
MOTOROLA INC27 citations91
US5310626AMay 10, 1994
Method for forming a patterned layer using dielectric materials as a light-sensitive material
MOTOROLA INC52 citations90
US6054377AApr 25, 2000
Method for forming an inlaid via in a semiconductor device
MOTOROLA INC38 citations89
US6284633B1Sep 4, 2001
Method for forming a tensile plasma enhanced nitride capping layer over a gate electrode
MOTOROLA INC33 citations88
US6218733B1Apr 17, 2001
Semiconductor device having a titanium-aluminum compound
MOTOROLA INC11 citations70
FREESCALE SEMICONDUCTOR INC
7 patentsUS7422979B2Sep 9, 2008
Method of forming a semiconductor device having a diffusion barrier stack and structure thereof
FREESCALE SEMICONDUCTOR INC14 citations82
US7442598B2Oct 28, 2008
Method of forming an interlayer dielectric
FREESCALE SEMICONDUCTOR INC10 citations78
US7504289B2Mar 17, 2009
Process for forming an electronic device including transistor structures with sidewall spacers
FREESCALE SEMICONDUCTOR INC7 citations73
US7074713B2Jul 11, 2006
Plasma enhanced nitride layer
FREESCALE SEMICONDUCTOR INC6 citations62
US7157377B2Jan 2, 2007
Method of making a semiconductor device using treated photoresist
FREESCALE SEMICONDUCTOR INC6 citations59
US7763538B2Jul 27, 2010
Dual plasma treatment barrier film to reduce low-k damage
FREESCALE SEMICONDUCTOR INC1 citations52
US7592273B2Sep 22, 2009
Semiconductor device with hydrogen barrier and method therefor
FREESCALE SEMICONDUCTOR INC0 citations35