Inventor
ISHIDA YASUTO
JP17 patents
⚠️ This page may combine multiple inventors who share the name “ISHIDA YASUTO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIMI INC
15 patentsUS10876073B2Dec 29, 2020
Composition for surface treatment, and method for surface treatment using the same
FUJIMI INC13 citations84
US9486892B2Nov 8, 2016
Polishing composition
FUJIMI INC13 citations82
US10876082B2Dec 29, 2020
Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate
FUJIMI INC2 citations71
US12312499B2May 27, 2025
Surface treatment method, method for producing semiconductor substrate including the surface treatment method, composition for surface treatment, and system for producing semiconductor substrate including the composition for surface treatment
FUJIMI INC0 citations62
US12249513B2Mar 11, 2025
Surface treatment method, method for producing semiconductor substrate including the surface treatment method, composition for surface treatment, and system for producing semiconductor substrate including the composition for surface treatment
FUJIMI INC0 citations62
US11466234B2Oct 11, 2022
Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate
FUJIMI INC0 citations62
US10781410B2Sep 22, 2020
Composition for surface treatment and method for surface treatment using the same
FUJIMI INC1 citations62
US10954479B2Mar 23, 2021
Composition for surface treatment and surface treatment method using the same
FUJIMI INC0 citations61
US10916435B2Feb 9, 2021
Surface treatment composition, method of producing surface treatment composition, method of treating surface, and method of producing semiconductor substrate
FUJIMI INC1 citations61
US11702570B2Jul 18, 2023
Polishing composition
FUJIMI INC0 citations59
US11692137B2Jul 4, 2023
Intermediate raw material, and polishing composition and composition for surface treatment using the same
FUJIMI INC0 citations59
US11162057B2Nov 2, 2021
Composition for surface treatment, method for producing composition for surface treatment, surface treatment method, and method for producing semiconductor substrate
FUJIMI INC0 citations59
US11028340B2Jun 8, 2021
Composition for surface treatment, method for producing the same, surface treatment method using composition for surface treatment, and method for producing semiconductor substrate
FUJIMI INC0 citations51
US11203731B2Dec 21, 2021
Composition for surface treatment and method of producing the same, surface treatment method, and method of producing semiconductor substrate
FUJIMI INC0 citations50
US10093834B2Oct 9, 2018
Polishing composition and polishing method
FUJIMI INC0 citations50