P

Inventor

GOHIRA TAKU

JP15 patents

Patents

15 patents
US10410877B2Sep 10, 2019

Etching method

TOKYO ELECTRON LTD40 citations92
US11804379B2Oct 31, 2023

Etching method and plasma processing apparatus

TOKYO ELECTRON LTD2 citations71
US10714370B2Jul 14, 2020

Mounting table and plasma processing apparatus

TOKYO ELECTRON LTD3 citations68
US12272526B2Apr 8, 2025

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD0 citations60
US11404281B2Aug 2, 2022

Method of etching silicon containing films selectively against each other

TOKYO ELECTRON LTD0 citations60
US10903084B2Jan 26, 2021

Method of etching silicon containing films selectively against each other

TOKYO ELECTRON LTD0 citations60
US12080521B2Sep 3, 2024

Plasma processing method

TOKYO ELECTRON LTD0 citations59
US11749508B2Sep 5, 2023

Plasma processing method

TOKYO ELECTRON LTD0 citations59
US11342167B2May 24, 2022

Plasma processing method including cleaning of inside of chamber main body of plasma processing apparatus

TOKYO ELECTRON LTD0 citations59
US11251049B2Feb 15, 2022

Etching method and plasma processing apparatus

TOKYO ELECTRON LTD0 citations51
US10304691B2May 28, 2019

Method of etching silicon oxide and silicon nitride selectively against each other

TOKYO ELECTRON LTD0 citations50
US11631590B2Apr 18, 2023

Substrate processing method, substrate processing apparatus and cleaning apparatus

TOKYO ELECTRON LTD0 citations48
US10811275B2Oct 20, 2020

Plasma etching method and plasma etching apparatus

TOKYO ELECTRON LTD0 citations48
US10714320B2Jul 14, 2020

Plasma processing method including cleaning of inside of chamber main body of plasma processing apparatus

TOKYO ELECTRON LTD0 citations48
US10361070B2Jul 23, 2019

Method of processing target object

TOKYO ELECTRON LTD0 citations38