Inventor

SHANG QUANYUAN

US55 patents

⚠️ This page may combine multiple inventors who share the name “SHANG QUANYUAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHANG QUANYUAN

APPLIED MATERIALS INC

Suspended gas distribution manifold for plasma chamber

Method and apparatus for in-situ film stack processing

Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow

Suspended gas distribution manifold for plasma chamber

Method and apparatus for enhancing chamber cleaning

Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition

Multiple frequency plasma chamber with grounding capacitor at cathode

Method and apparatus for dechucking a substrate

Method and apparatus for metallization of large area substrates

Methods to form metal lines using selective electrochemical deposition

Method for dechucking a substrate

Low temperature process for passivation applications

Method and apparatus for electrostatically maintaining substrate flatness

Fluorine process for cleaning semiconductor process chamber

Deposition of passivation layers for active matrix liquid crystal display (AMLCD) applications

On-site cleaning gas generation for process chamber cleaning

Apparatus for electrostatically maintaining subtrate flatness

Methods and systems for inkjet drop positioning

Chamber for uniform substrate heating

Chamber for uniform substrate heating

Methods and apparatus for aligning print heads

Pecvd silicon oxide thin film deposition

Methods and apparatus for precision control of print head assemblies

Shadow frame with cross beam for semiconductor equipment

Method and apparatus for enhanced chamber cleaning

Application of carbon doped silicon oxide film to flat panel industry

Plasma display panel with a low k dielectric layer

Low temperature process for TFT fabrication

Low temperature process for TFT fabrication

Apparatus and methods for an inkjet head support having an inkjet head capable of independent lateral movement

Green printing ink for color filter applications

On-site cleaning gas generation for process chamber cleaning

Reducing electrostatic charge by roughening the susceptor

Plasma display panel with a low K dielectric layer

Method and apparatus for silicon oxide deposition on large area substrates

Methods and apparatus for a high resolution inkjet fire pulse generator

Shadow frame with cross beam for semiconductor equipment

Methods and apparatus for depositing ink onto substrates

APPLIED KOMATSU TECHNOLOGY INC

Surface-treated shower head for use in a substrate processing chamber

Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology

Deposition chamber cleaning technique using a high power remote excitation source

Film deposition using a finger type shadow frame

Dual frequency excitation of plasma for film deposition

Surface-treated shower head for use in a substrate processing chamber

Method and apparatus for electrostatically maintaining substrate flatness

High-power, plasma-based, reactive species generator

Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology

High power microwave plasma applicator

SHANG QUANYUAN

In-situ deposition of battery active lithium materials by plasma spraying

APPLIED TECHNOLOGY INC

Annealing an amorphous film using microwave energy