Inventor

WHITE JOHN M

US241 patents

⚠️ This page may combine multiple inventors who share the name “WHITE JOHN M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WHITE JOHN M

APPLIED MATERIALS INC

Method of controlling the film properties of PECVD-deposited thin films

Method and apparatus for in-situ film stack processing

Suspended gas distribution plate

Flexibly suspended gas distribution manifold for plasma chamber

Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow

Flexibly suspended gas distribution manifold for plasma chamber

Apparatus and methods for chemical mechanical polishing with an advanceable polishing sheet

Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process

Single substrate vacuum processing apparatus having improved exhaust system

Vacuum processing apparatus having improved throughput

Method and apparatus for protection of conductive surfaces in a plasma processing reactor

Plasma-enhanced CVD process using TEOS for depositing silicon oxide

Thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process

Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process

Process for PECVD of silicon oxide using TEOS decomposition

CVD of silicon oxide using TEOS decomposition and in-situ planarization process

Inlet manifold and methods for increasing gas dissociation and for PECVD of dielectric films

Method of heating and cooling large area substrates and apparatus therefor

CVD Processing chamber

Method for plasma processing using magnetically enhanced plasma chemical vapor deposition

Magnetic field-enhanced plasma etch reactor

Magnetic field-enhanced plasma etch reactor

Methods and apparatus for symmetrical and/or concentric radio frequency matching networks

Tunable gas distribution plate assembly

System for chemical mechanical planarization

Alignment of a shadow frame and large flat substrates on a heated support

Showerhead mounting to accommodate thermal expansion

Vacuum processing system having improved substrate heating and cooling

Substrate transfer shuttle having a magnetic drive

APPLIED KOMATSU TECHNOLOGY INC

Substrate transfer shuttle having a magnetic drive

Substrate transfer shuttle

Modular substrate processing system

Automated substrate processing system

Method and apparatus for substrate transfer and processing

In-situ substrate transfer shuttle

Multi-function chamber for a substrate processing system

Isolation valves

Multi-function chamber for a substrate processing system

Film deposition using a finger type shadow frame

Method of controlling gas flow in a substrate processing system

Gas flow control in a substrate processing system

CHOI SOO YOUNG

Diffuser plate with slit valve compensation

Plasma uniformity control by gas diffuser curvature

Particle reduction on surfaces of chemical vapor deposition processing apparatus

Plasma uniformity control by gas diffuser hole design

WHITE JOHN M

Alignment of a shadow frame and large flat substrates on a support

Methods and apparatus for sealing a chamber

KUDELA JOZEF

Guided wave applicator with non-gaseous dielectric for plasma chamber

SORENSEN CARL A

RF bus and RF return bus for plasma chamber electrode

PARK BEOM SOO

Frequency monitoring to detect plasma process abnormality