Inventor
MAK STEVE S Y
US16 patents
⚠️ This page may combine multiple inventors who share the name “MAK STEVE S Y”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
14 patentsUS6120640ASep 19, 2000
Boron carbide parts and coatings in a plasma reactor
APPLIED MATERIALS INC348 citations99
US5885358AMar 23, 1999
Gas injection slit nozzle for a plasma process reactor
APPLIED MATERIALS INC203 citations98
US5756400AMay 26, 1998
Method and apparatus for cleaning by-products from plasma chamber surfaces
APPLIED MATERIALS INC407 citations98
US5746875AMay 5, 1998
Gas injection slit nozzle for a plasma process reactor
APPLIED MATERIALS INC169 citations98
US5643394AJul 1, 1997
Gas injection slit nozzle for a plasma process reactor
APPLIED MATERIALS INC215 citations98
US5942039AAug 24, 1999
Self-cleaning focus ring
APPLIED MATERIALS INC66 citations96
US5891348AApr 6, 1999
Process gas focusing apparatus and method
APPLIED MATERIALS INC61 citations96
US5545289AAug 13, 1996
Passivating, stripping and corrosion inhibition of semiconductor substrates
APPLIED MATERIALS INC184 citations94
US6598615B1Jul 29, 2003
Compact independent pressure control and vacuum isolation for a turbomolecular pumped plasma reaction chamber
APPLIED MATERIALS INC20 citations92
US6323132B1Nov 27, 2001
Etching methods for anisotropic platinum profile
APPLIED MATERIALS INC36 citations92
US6277251B1Aug 21, 2001
Apparatus and method for shielding a dielectric member to allow for stable power transmission into a plasma processing chamber
APPLIED MATERIALS INC25 citations92
US6270687B1Aug 7, 2001
RF plasma method
APPLIED MATERIALS INC42 citations91
US6919168B2Jul 19, 2005
Masking methods and etching sequences for patterning electrodes of high density RAM capacitors
APPLIED MATERIALS INC31 citations90
US6265318B1Jul 24, 2001
Iridium etchant methods for anisotropic profile
APPLIED MATERIALS INC30 citations89