Inventor

YIN GERALD ZHEYAO

US41 patents

⚠️ This page may combine multiple inventors who share the name “YIN GERALD ZHEYAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YIN GERALD ZHEYAO

APPLIED MATERIALS INC

Plasma reactor with overhead RF electrode tuned to the plasma

Boron carbide parts and coatings in a plasma reactor

Compartnetalized substrate processing chamber

Inductively and multi-capacitively coupled plasma reactor

Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression

Self-cleaning etch process

Plasma reactor using inductive RF coupling, and processes

Plasma reactor having a helicon wave high density plasma source

Self-cleaning etch process

Gas injection slit nozzle for a plasma process reactor

Method and apparatus for cleaning by-products from plasma chamber surfaces

Gas injection slit nozzle for a plasma process reactor

Gas injection slit nozzle for a plasma process reactor

System level in-situ integrated dielectric etch process particularly useful for copper dual damascene

Magnetic confinement in a plasma reactor having an RF bias electrode

Process for etching oxide using a hexafluorobutadiene and manifesting a wide process window

Treatment of etching chambers using activated cleaning gas

Plasma etch processes

Lift pin for dechucking substrates

Plasma reactor with heated source of a polymer-hardening precursor material

Magnetically confined plasma reactor for processing a semiconductor wafer

Inductively and multi-capacitively coupled plasma reactor

Plasma uniformity control for an inductive plasma source

Process gas focusing apparatus and method

Compartmentalized substrate processing chamber

RF plasma reactor with cleaning electrode for cleaning during processing of semiconductor wafers

RF plasma reactor with hybrid conductor and multi-radius dome ceiling

High etch rate residue free metal etch process with low frequency high power inductive coupled plasma

System level in-situ integrated dielectric etch process particularly useful for copper dual damascene

Plasma reactor with heated source of a polymer-hardening precursor material

Plasma reactor with heated source of a polymer-hardening precursor material

Silane etching process

RF plasma reactor with hybrid conductor and multi-radius dome ceiling

RF plasma method

RF plasma reactor with hybrid conductor and multi-radius dome ceiling

(unassigned)

Highly selective process for etching oxide over nitride using hexafluorobutadiene

System level in-situ integrated dielectric etch process particularly useful for copper dual damascene

ADVANCED MICRO FABRICATION EQUIPMENT INC CHINA

Semiconductor processing system

Plasma reactor for ultra-high aspect ratio etching and etching method thereof

HOFFMAN DANIEL J

Plasma reactor with overhead RF electrode tuned to the plasma

LIU ZHONGDU

Capacitive-coupled plasma processing apparatus and method for processing substrate