Inventor

SINTA ROGER F

US36 patents

⚠️ This page may combine multiple inventors who share the name “SINTA ROGER F”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SINTA ROGER F

SHIPLEY CO LLC

Antireflective coating compositions

Methods utilizing antireflective coating compositions with exposure under 200 nm

Photoresist compositions and methods and articles of manufacture comprising same

Antireflective coating compositions

Antireflective coating compositions and exposure methods under 200 nm

Photoimageable compositions comprising multiple arylsulfonium photoactive compounds

Photoimageable resist compositions containing photobase generator

Photoresist compositions

Narrow molecular weight distribution polymers and use of same as resin binders for negative-acting photoresists

Polymers and photoresist compositions

Dyed photoresists and methods and articles of manufacture comprising same

Polymer for positive acid catalyzed resists

Compositions comprising photoactivator, acid, generator and chain extender

Photoresist compositions

Dyed photoresists and methods and articles of manufacture comprising same

Acid labile photoactive composition

Positive acid catalyzed resists

Photoresist composition with improved differential solubility through hydroxyl group blocking via reaction with vinyl ethers

Photoresist composition

Photoresist compositions

Photoresist compositions

Hydroxyphenyl copolymers and photoresists comprising same

Positive acid catalyzed resists having an alkali soluble resin with acid labile groups and inert blocking groups

Dyed photoresists and methods and articles of manufacture comprising same

Acid labile photoactive composition

Method for increasing the differential solubility of an imaged photoresist through hydroxy group blocking via reaction with vinyl ethers

Polymer for positive acid catalyzed resists

POLAROID CORP

Liquid crystal mixtures having widened smectic temperature range

Melt-processable aromatic polyesteramide having repeating 2,2&#39;-substituted biphenylene radicals

Melt-processable polyesteramides having para-linked, substituted-phenylene radicals

Low-melting aromatic polyesters of trifluoromethyl terephthalic acid or ester forming derivatives thereof

SHIPLEY CO

Benzyl-substituted photoactive compounds and photoresist compositions comprising same

Photoimageable compositions for electrodeposition

ROHM & HAAS ELECT MAT

Dyed photoresists and methods and articles of manufacture comprising same

IBM CORP OF ARMONK

Methods for preparing photoresist compositions

POLAROID CORP PATENT DEPT

Low-melting aromatic polyesters with repeating 2,2&#39;-substituted-biphenylene radicals

Melt-processable aromatic polyesteramide having repeating 2,2'-substituted biphenylene radicals

Low-melting aromatic polyesters with repeating 2,2'-substituted-biphenylene radicals