Inventor
HAYASHI SHIGENORI
JP82 patents
⚠️ This page may combine multiple inventors who share the name “HAYASHI SHIGENORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEMICONDUCTOR ENERGY LAB
37 patentsUS6468617B1Oct 22, 2002
Apparatus for fabricating coating and method of fabricating the coating
SEMICONDUCTOR ENERGY LAB103 citations99
US6183816B1Feb 6, 2001
Method of fabricating the coating
SEMICONDUCTOR ENERGY LAB111 citations99
US6171674B1Jan 9, 2001
Hard carbon coating for magnetic recording medium
SEMICONDUCTOR ENERGY LAB121 citations99
US5932302AAug 3, 1999
Method for fabricating with ultrasonic vibration a carbon coating
SEMICONDUCTOR ENERGY LAB125 citations99
US5578130ANov 26, 1996
Apparatus and method for depositing a film
SEMICONDUCTOR ENERGY LAB283 citations99
US5427824AJun 27, 1995
CVD apparatus
SEMICONDUCTOR ENERGY LAB352 citations99
US5221427AJun 22, 1993
Plasma generating device and method of plasma processing
SEMICONDUCTOR ENERGY LAB151 citations99
US5183511AFeb 2, 1993
Photo CVD apparatus with a glow discharge system
SEMICONDUCTOR ENERGY LAB532 citations99
US6835523B1Dec 28, 2004
Apparatus for fabricating coating and method of fabricating the coating
SEMICONDUCTOR ENERGY LAB96 citations98
US5549780AAug 27, 1996
Method for plasma processing and apparatus for plasma processing
SEMICONDUCTOR ENERGY LAB320 citations98
US4950624AAug 21, 1990
Method of depositing films using photo-CVD with chamber plasma cleaning
SEMICONDUCTOR ENERGY LAB356 citations97
US6194047B1Feb 27, 2001
Magnetic recording medium
SEMICONDUCTOR ENERGY LAB39 citations96
US6001431ADec 14, 1999
Process for fabricating a magnetic recording medium
SEMICONDUCTOR ENERGY LAB60 citations96
US5989672ANov 23, 1999
Magnetic recording medium
SEMICONDUCTOR ENERGY LAB55 citations96
US5637373AJun 10, 1997
Magnetic recording medium
SEMICONDUCTOR ENERGY LAB28 citations96
US5369336ANov 29, 1994
Plasma generating device
SEMICONDUCTOR ENERGY LAB62 citations96
US5304407AApr 19, 1994
Method for depositing a film
SEMICONDUCTOR ENERGY LAB69 citations96
US5288684AFeb 22, 1994
Photochemical vapor phase reaction apparatus and method of causing a photochemical vapor phase reaction
SEMICONDUCTOR ENERGY LAB608 citations96
US5240801AAug 31, 1993
Image-forming member for electrophotography and manufacturing method for the same
SEMICONDUCTOR ENERGY LAB53 citations96
US5238705AAug 24, 1993
Carbonaceous protective films and method of depositing the same
SEMICONDUCTOR ENERGY LAB58 citations96
US5230931AJul 27, 1993
Plasma-assisted cvd of carbonaceous films by using a bias voltage
SEMICONDUCTOR ENERGY LAB81 citations96
US5198724AMar 30, 1993
Plasma processing method and plasma generating device
SEMICONDUCTOR ENERGY LAB80 citations96
US6191492B1Feb 20, 2001
Electronic device including a densified region
SEMICONDUCTOR ENERGY LAB52 citations95
US5147822ASep 15, 1992
Plasma processing method for improving a package of a semiconductor device
SEMICONDUCTOR ENERGY LAB57 citations95
US7700164B2Apr 20, 2010
Apparatus for fabricating coating and method of fabricating the coating
SEMICONDUCTOR ENERGY LAB25 citations93
US6258434B1Jul 10, 2001
Magnetic recording medium
SEMICONDUCTOR ENERGY LAB22 citations93
US6165582ADec 26, 2000
Magnetic recording medium
SEMICONDUCTOR ENERGY LAB17 citations93
US5648000AJul 15, 1997
Plasma Processing method
SEMICONDUCTOR ENERGY LAB19 citations93
US5256509AOct 26, 1993
Image-forming member for electrophotography and manufacturing method for the same
SEMICONDUCTOR ENERGY LAB33 citations93
US5145711ASep 8, 1992
Cyclotron resonance chemical vapor deposition method of forming a halogen-containing diamond on a substrate
SEMICONDUCTOR ENERGY LAB31 citations93
US6013338AJan 11, 2000
CVD apparatus
SEMICONDUCTOR ENERGY LAB18 citations92
US5855970AJan 5, 1999
Method of forming a film on a substrate
SEMICONDUCTOR ENERGY LAB21 citations92
US5629482AMay 13, 1997
Measuring device utilizing a thermo-electromotive element
SEMICONDUCTOR ENERGY LAB21 citations92
US5629245AMay 13, 1997
Method for forming a multi-layer planarization structure
SEMICONDUCTOR ENERGY LAB19 citations92
US5185179AFeb 9, 1993
Plasma processing method and products thereof
SEMICONDUCTOR ENERGY LAB34 citations92
US7264850B1Sep 4, 2007
Process for treating a substrate with a plasma
SEMICONDUCTOR ENERGY LAB16 citations84
US6756670B1Jun 29, 2004
Electronic device and its manufacturing method
SEMICONDUCTOR ENERGY LAB15 citations83
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD
9 patentsUS6030667AFeb 29, 2000
Apparatus and method for applying RF power apparatus and method for generating plasma and apparatus and method for processing with plasma
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD194 citations99
US5928528AJul 27, 1999
Plasma treatment method and plasma treatment system
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD190 citations98
US6667246B2Dec 23, 2003
Wet-etching method and method for manufacturing semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD75 citations96
US5838111ANov 17, 1998
Plasma generator with antennas attached to top electrodes
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD53 citations96
US5674366AOct 7, 1997
Method and apparatus for fabrication of dielectric thin film
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD59 citations96
US5755888AMay 26, 1998
Method and apparatus of forming thin films
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD30 citations93
US5719740AFeb 17, 1998
Capacitance sensor
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD34 citations93
US5507080AApr 16, 1996
Method of manufacturing a capacitance sensor
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD26 citations93
US7488655B2Feb 10, 2009
Method for fabricating semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD14 citations84
RICOH KK
3 patentsPANASONIC CORP
1 patentShowing the top 50 of 82 patents by PatentIndex Score.