Inventor
HATA MITSUHIRO
KR17 patents
⚠️ This page may combine multiple inventors who share the name “HATA MITSUHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
9 patentsUS7855038B2Dec 21, 2010
Mask patterns for semiconductor device fabrication and related methods and structures
SAMSUNG ELECTRONICS CO LTD21 citations92
US7361609B2Apr 22, 2008
Mask patterns for semiconductor device fabrication and related methods
SAMSUNG ELECTRONICS CO LTD27 citations92
US7314691B2Jan 1, 2008
Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device
SAMSUNG ELECTRONICS CO LTD18 citations92
US7384730B2Jun 10, 2008
Top coating composition for photoresist and method of forming photoresist pattern using same
SAMSUNG ELECTRONICS CO LTD13 citations84
US7604911B2Oct 20, 2009
Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor device
SAMSUNG ELECTRONICS CO LTD5 citations73
US7361612B2Apr 22, 2008
Barrier coating compositions containing silicon and methods of forming photoresist patterns using the same
SAMSUNG ELECTRONICS CO LTD2 citations62
US7642042B2Jan 5, 2010
Polymer, top coating layer, top coating composition and immersion lithography process using the same
SAMSUNG ELECTRONICS CO LTD0 citations52
US7468235B2Dec 23, 2008
Barrier coating compositions containing fluorine and methods of forming photoresist patterns using such compositions
SAMSUNG ELECTRONICS CO LTD0 citations51
US7985529B2Jul 26, 2011
Mask patterns including gel layers for semiconductor device fabrication
SAMSUNG ELECTRONICS CO LTD0 citations41