P

Inventor

DOKAN TAKASHI

JP18 patents
⚠️ This page may combine multiple inventors who share the name “DOKAN TAKASHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

16 patents
US10553407B2Feb 4, 2020

Plasma processing method and plasma processing apparatus

TOKYO ELECTRON LTD47 citations97
US11742181B2Aug 29, 2023

Control method and plasma processing apparatus

TOKYO ELECTRON LTD5 citations85
US11476089B2Oct 18, 2022

Control method and plasma processing apparatus

TOKYO ELECTRON LTD7 citations85
US11871503B2Jan 9, 2024

Plasma processing method and plasma processing apparatus

TOKYO ELECTRON LTD2 citations73
US11337297B2May 17, 2022

Plasma processing method and plasma processing apparatus

TOKYO ELECTRON LTD2 citations73
US11170979B2Nov 9, 2021

Plasma etching method and plasma etching apparatus

TOKYO ELECTRON LTD4 citations73
US10622197B2Apr 14, 2020

Plasma processing apparatus and plasma processing method

TOKYO ELECTRON LTD2 citations73
US12165842B2Dec 10, 2024

Control method and plasma processing apparatus

TOKYO ELECTRON LTD2 citations72
US11742182B2Aug 29, 2023

Control method and plasma processing apparatus

TOKYO ELECTRON LTD3 citations72
US12537172B2Jan 27, 2026

Plasma processing method and plasma processing apparatus

TOKYO ELECTRON LTD0 citations62
US11764082B2Sep 19, 2023

Control method and plasma processing apparatus

TOKYO ELECTRON LTD0 citations52
US11282701B2Mar 22, 2022

Plasma processing method and plasma processing apparatus

TOKYO ELECTRON LTD0 citations52
US11087960B2Aug 10, 2021

Radio frequency power source and plasma processing apparatus

TOKYO ELECTRON LTD0 citations52
US11017985B2May 25, 2021

Plasma processing apparatus, impedance matching method, and plasma processing method

TOKYO ELECTRON LTD0 citations52
US12198962B2Jan 14, 2025

Maintenance device, vacuum processing system, and maintenance method

TOKYO ELECTRON LTD0 citations51
US9870901B2Jan 16, 2018

Method of producing processing condition of plasma processing apparatus, and plasma processing apparatus

TOKYO ELECTRON LTD0 citations41

RENESAS TECH CORP

1 patent

DOKAN TAKASHI

1 patent