Inventor
MICKAN UWE
NL20 patents
⚠️ This page may combine multiple inventors who share the name “MICKAN UWE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
18 patentsUS9606448B2Mar 28, 2017
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV2 citations73
US7145640B2Dec 5, 2006
Lithographic apparatus, device manufacturing method and variable attenuator
ASML NETHERLANDS BV8 citations72
US7042550B2May 9, 2006
Device manufacturing method and computer program
ASML NETHERLANDS BV8 citations71
US7098994B2Aug 29, 2006
Lithographic apparatus, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV7 citations69
US7514186B2Apr 7, 2009
System for electrically connecting a mask to earth, a mask
ASML NETHERLANDS BV7 citations68
US7960074B2Jun 14, 2011
Method of generating a photolithography patterning device, computer program, patterning device, method of determining the position of a target image on or proximate a substrate, measurement device, and lithographic apparatus
ASML NETHERLANDS BV6 citations62
US7463336B2Dec 9, 2008
Device manufacturing method and apparatus with applied electric field
ASML NETHERLANDS BV3 citations62
US7136149B2Nov 14, 2006
Lithographic apparatus with autofocus system
ASML NETHERLANDS BV2 citations62
US6980281B2Dec 27, 2005
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV6 citations62
US7834975B2Nov 16, 2010
Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly
ASML NETHERLANDS BV2 citations61
US7817246B2Oct 19, 2010
Optical apparatus
ASML NETHERLANDS BV2 citations61
US7518706B2Apr 14, 2009
Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordingly
ASML NETHERLANDS BV5 citations61
US7177010B2Feb 13, 2007
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV3 citations61
US7713665B2May 11, 2010
Lithographic apparatus and patterning device
ASML NETHERLANDS BV2 citations53
US10146142B2Dec 4, 2018
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations52
US9442388B2Sep 13, 2016
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations52
US7369216B2May 6, 2008
Lithographic system, method for adapting transmission characteristics of an optical pathway within a lithographic system, semiconductor device, method of manufacturing a reflective element for use in a lithographic system, and reflective element manufactured thereby
ASML NETHERLANDS BV1 citations52
US7092072B2Aug 15, 2006
Calibration apparatus and method of calibrating a radiation sensor in a lithographic apparatus
ASML NETHERLANDS BV1 citations51