Inventor
SHI JIANOU
US26 patents
⚠️ This page may combine multiple inventors who share the name “SHI JIANOU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR TECH CORP
13 patentsUS7893703B2Feb 22, 2011
Systems and methods for controlling deposition of a charge on a wafer for measurement of one or more electrical properties of the wafer
KLA TENCOR TECH CORP104 citations96
US7248062B1Jul 24, 2007
Contactless charge measurement of product wafers and control of corona generation and deposition
KLA TENCOR TECH CORP30 citations92
US7103484B1Sep 5, 2006
Non-contact methods for measuring electrical thickness and determining nitrogen content of insulating films
KLA TENCOR TECH CORP54 citations92
US7064565B1Jun 20, 2006
Methods and systems for determining an electrical property of an insulating film
KLA TENCOR TECH CORP21 citations92
US7075318B1Jul 11, 2006
Methods for imperfect insulating film electrical thickness/capacitance measurement
KLA TENCOR TECH CORP20 citations90
US7719294B1May 18, 2010
Systems configured to perform a non-contact method for determining a property of a specimen
KLA TENCOR TECH CORP10 citations83
US7110238B1Sep 19, 2006
Systems and methods for using non-contact voltage sensors and corona discharge guns
KLA TENCOR TECH CORP11 citations81
US7098050B1Aug 29, 2006
Corona based charge voltage measurement
KLA TENCOR TECH CORP6 citations71
US6909291B1Jun 21, 2005
Systems and methods for using non-contact voltage sensors and corona discharge guns
KLA TENCOR TECH CORP9 citations70
US7538333B1May 26, 2009
Contactless charge measurement of product wafers and control of corona generation and deposition
KLA TENCOR TECH CORP3 citations62
US7187186B2Mar 6, 2007
Methods and systems for determining one or more properties of a specimen
KLA TENCOR TECH CORP6 citations59
US7345306B1Mar 18, 2008
Corona based charge voltage measurement
KLA TENCOR TECH CORP0 citations49
US7397254B1Jul 8, 2008
Methods for imperfect insulating film electrical thickness/capacitance measurement
KLA TENCOR TECH CORP1 citations48
KLA TENCOR CORP
5 patentsUS8004290B1Aug 23, 2011
Method and apparatus for determining dielectric layer properties
KLA TENCOR CORP12 citations82
US7525304B1Apr 28, 2009
Measurement of effective capacitance
KLA TENCOR CORP18 citations82
US11249110B2Feb 15, 2022
Resistivity probes with curved portions
KLA TENCOR CORP0 citations56
US10514391B2Dec 24, 2019
Resistivity probe having movable needle bodies
KLA TENCOR CORP1 citations56
US9435826B2Sep 6, 2016
Variable spacing four-point probe pin device and method
KLA TENCOR CORP0 citations34
FUSION SYSTEMS CORP
3 patentsUS5791782AAug 11, 1998
Contact temperature probe with unrestrained orientation
FUSION SYSTEMS CORP517 citations97
US5961851AOct 5, 1999
Microwave plasma discharge device
FUSION SYSTEMS CORP37 citations90
US5767626AJun 16, 1998
Electrodeless lamp starting/operation with sources at different frequencies
FUSION SYSTEMS CORP6 citations60
NOVELLUS SYSTEMS INC
2 patentsUS6284050B1Sep 4, 2001
UV exposure for improving properties and adhesion of dielectric polymer films formed by chemical vapor deposition
NOVELLUS SYSTEMS INC647 citations96
US6265320B1Jul 24, 2001
Method of minimizing reactive ion etch damage of organic insulating layers in semiconductor fabrication
NOVELLUS SYSTEMS INC54 citations92