Inventor
MATSUYAMA TOMOYUKI
JP30 patents
⚠️ This page may combine multiple inventors who share the name “MATSUYAMA TOMOYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
24 patentsUS6198576B1Mar 6, 2001
Projection optical system and exposure apparatus
NIKON CORP89 citations98
US7423731B2Sep 9, 2008
Illumination optical system, exposure apparatus, and exposure method with polarized switching device
NIKON CORP59 citations97
US7230682B2Jun 12, 2007
Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium
NIKON CORP49 citations96
US7515248B2Apr 7, 2009
Illumination optical system, exposure apparatus, and exposure method with polarized state detection result and adjustment
NIKON CORP25 citations92
US6639651B2Oct 28, 2003
Fabrication method for correcting member, fabrication method for projection optical system, and exposure apparatus
NIKON CORP26 citations92
US6166865ADec 26, 2000
Projection optical system and exposure apparatus
NIKON CORP35 citations92
US5920379AJul 6, 1999
Projection exposure method and apparatus
NIKON CORP17 citations92
US5852490ADec 22, 1998
Projection exposure method and apparatus
NIKON CORP44 citations92
US9423694B2Aug 23, 2016
Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
NIKON CORP4 citations84
US7405803B2Jul 29, 2008
Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium
NIKON CORP10 citations84
US9286416B2Mar 15, 2016
Scanner based optical proximity correction system and method of use
NIKON CORP4 citations82
US8365107B2Jan 29, 2013
Scanner based optical proximity correction system and method of use
NIKON CORP10 citations82
US11854288B2Dec 26, 2023
Image determining device to determine the state of a subject
NIKON CORP1 citations72
US10338480B2Jul 2, 2019
Lithography system, simulation apparatus, and pattern forming method
NIKON CORP2 citations72
US10234756B2Mar 19, 2019
Scanner based optical proximity correction system and method of use
NIKON CORP2 citations71
US9753363B2Sep 5, 2017
Scanner based optical proximity correction system and method of use
NIKON CORP3 citations71
US7102728B2Sep 5, 2006
Imaging optical system evaluation method, imaging optical system adjustment method, exposure apparatus and exposure method
NIKON CORP4 citations63
US7515247B2Apr 7, 2009
Illumination optical system, exposure apparatus, and exposure method with polarized state fluctuation correcting device
NIKON CORP2 citations62
US11055522B2Jul 6, 2021
Image determining device to determine the state of a subject
NIKON CORP0 citations61
US10241417B2Mar 26, 2019
Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
NIKON CORP0 citations52
US10234770B2Mar 19, 2019
Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
NIKON CORP0 citations52
US7391497B2Jun 24, 2008
Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium
NIKON CORP0 citations52
US10846457B2Nov 24, 2020
Lithography system, simulation apparatus, and pattern forming method
NIKON CORP0 citations51
US10275645B2Apr 30, 2019
Image determining device to determine the state of a subject
NIKON CORP0 citations51
TANITSU OSAMU
2 patentsUS9140990B2Sep 22, 2015
Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
TANITSU OSAMU8 citations84
US10007194B2Jun 26, 2018
Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
TANITSU OSAMU1 citations62