Inventor

FUNK MERRITT

US100 patents

⚠️ This page may combine multiple inventors who share the name “FUNK MERRITT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FUNK MERRITT

TOKYO ELECTRON LTD

Method and apparatus for the monitoring and control of a semiconductor manufacturing process

Method and apparatus for monitoring tool performance

Fault detection and classification (FDC) using a run-to-run controller

Energetic negative ion impact ionization plasma

Electric pressure systems for control of plasma properties and uniformity

Method and system for controlling radical distribution

DC and RF hybrid processing system

Multi-plasma neutral beam source and method of operating

Method and system for controlling radical distribution

Method for processing data based on the data context

Feedforward, feedback wafer to wafer control method for an etch process

Multi-layer/multi-input/multi-output (MLMIMO) models and method for using

Using Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models for metal-gate structures

Iso/nested control for soft mask processing

Measuring a damaged structure formed on a wafer using optical metrology

Formula-based run-to-run control

Power generation systems and methods for plasma stability and control

Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma properties

Apparatus and method for improving photoresist properties using a quasi-neutral beam

Creating multi-layer/multi-input/multi-output (MLMIMO) models for metal-gate structures

Dynamic control of process chemistry for improved within-substrate process uniformity

Method and apparatus for creating a gate optimization evaluation library

Using a virtual profile library

Method and apparatus for spacer-optimization (S-O)

Real-time parameter tuning for etch processes

Real-time parameter tuning using wafer thickness

Method for dynamic sensor configuration and runtime execution

Measuring a damaged structure formed on a wafer using optical metrology

Real-time parameter tuning using wafer temperature

Method of using a wafer-temperature-dependent profile library

Dynamic metrology sampling with wafer uniformity control

Dynamic metrology sampling for a dual damascene process

Refining a virtual profile library

Method and apparatus for creating a Spacer-Optimization (S-O) library

RF voltage and current (V-I) sensors and measurement methods

Process control using physical modules and virtual modules

Electric pressure systems for control of plasma properties and uniformity

RF measurement system and method

Scalable and uniformity controllable diffusion plasma source

Method and apparatus for providing an anisotropic and mono-energetic neutral beam by non-ambipolar electron plasma

Damage assessment of a wafer using optical metrology

CHEN LEE

Plasma source pumping and gas injection baffle

Stable surface wave plasma source

Ion energy analyzer

FUNK MERRITT

Ion energy analyzer and methods of manufacturing the same

Methods of electrical signaling in an ion energy analyzer

ZHAO JIANPING

Low electron temperature microwave surface-wave plasma (SWP) processing method and apparatus

TOKYO ELECTON LTD

Method and apparatus for optimizing a gate channel

IBM

Wafer-to-wafer control using virtual modules

CHEN ZHIYING

Variable capacitance chamber component incorporating a semiconductor junction and methods of manufacturing and using thereof