Inventor
INADA HIROICHI
JP31 patents
⚠️ This page may combine multiple inventors who share the name “INADA HIROICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
23 patentsUS5658615AAug 19, 1997
Method of forming coating film and apparatus therefor
TOKYO ELECTRON LTD187 citations97
US6752872B2Jun 22, 2004
Coating unit and coating method
TOKYO ELECTRON LTD50 citations96
US6063190AMay 16, 2000
Method of forming coating film and apparatus therefor
TOKYO ELECTRON LTD94 citations96
US5942035AAug 24, 1999
Solvent and resist spin coating apparatus
TOKYO ELECTRON LTD103 citations96
US6919913B1Jul 19, 2005
Processing system
TOKYO ELECTRON LTD21 citations93
US5625433AApr 29, 1997
Apparatus and method for developing resist coated on a substrate
TOKYO ELECTRON LTD61 citations93
US6730599B2May 4, 2004
Film forming method and film forming apparatus
TOKYO ELECTRON LTD18 citations92
US6616762B2Sep 9, 2003
Treatment solution supply apparatus and treatment solution supply method
TOKYO ELECTRON LTD29 citations92
US6541376B2Apr 1, 2003
Film forming method and film forming apparatus
TOKYO ELECTRON LTD24 citations92
US6419408B1Jul 16, 2002
Developing process and developing unit
TOKYO ELECTRON LTD35 citations92
US6309116B1Oct 30, 2001
Substrate processing system
TOKYO ELECTRON LTD26 citations92
US6238107B1May 29, 2001
Developing apparatus
TOKYO ELECTRON LTD25 citations92
US7802536B2Sep 28, 2010
Apparatus and method of forming an applied film
TOKYO ELECTRON LTD15 citations84
US6982102B2Jan 3, 2006
Coating unit and coating method
TOKYO ELECTRON LTD15 citations84
US11273464B2Mar 15, 2022
Substrate processing apparatus
TOKYO ELECTRON LTD10 citations82
US10643872B2May 5, 2020
Liquid processing apparatus, liquid processing method, and storage medium
TOKYO ELECTRON LTD5 citations71
US10168618B2Jan 1, 2019
Liquid processing method and storage medium
TOKYO ELECTRON LTD5 citations71
US10074548B2Sep 11, 2018
Chemical liquid discharge mechanism, liquid processing apparatus, chemical liquid discharge method, and storage medium
TOKYO ELECTRON LTD2 citations71
US7344600B2Mar 18, 2008
Substrate treatment apparatus
TOKYO ELECTRON LTD6 citations62
US10755952B2Aug 25, 2020
Chemical liquid discharge mechanism, liquid processing apparatus, chemical liquid discharge method, and storage medium
TOKYO ELECTRON LTD1 citations61
US12257611B2Mar 25, 2025
Cleaning jig, coating apparatus, and cleaning method
TOKYO ELECTRON LTD0 citations50
US11862485B2Jan 2, 2024
Nozzle standby device, liquid processing apparatus and operation method of liquid processing apparatus
TOKYO ELECTRON LTD0 citations50
US11868057B2Jan 9, 2024
Solution treatment apparatus and cleaning method
TOKYO ELECTRON LTD0 citations49