Inventor
OGATA NOBUHIRO
JP38 patents
⚠️ This page may combine multiple inventors who share the name “OGATA NOBUHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
21 patentsUS7976896B2Jul 12, 2011
Method of processing a substrate and apparatus processing the same
TOKYO ELECTRON LTD9 citations83
US11574827B2Feb 7, 2023
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD4 citations74
US11712710B2Aug 1, 2023
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD3 citations72
US9721813B2Aug 1, 2017
Liquid processing apparatus with cleaning jig
TOKYO ELECTRON LTD3 citations70
US9387520B2Jul 12, 2016
Liquid processing apparatus and cleaning method
TOKYO ELECTRON LTD4 citations69
US11056335B2Jul 6, 2021
Substrate processing apparatus
TOKYO ELECTRON LTD1 citations62
US12515243B2Jan 6, 2026
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations52
US11880213B2Jan 23, 2024
Substrate liquid processing apparatus and substrate liquid processing method
TOKYO ELECTRON LTD0 citations52
US11024518B2Jun 1, 2021
Substrate processing apparatus, substrate processing method and recording medium
TOKYO ELECTRON LTD0 citations52
US9933702B2Apr 3, 2018
Substrate processing apparatus
TOKYO ELECTRON LTD0 citations52
US12148632B2Nov 19, 2024
Substrate processing apparatus and cleaning method of mist guard
TOKYO ELECTRON LTD0 citations51
US12051605B2Jul 30, 2024
Substrate processing apparatus
TOKYO ELECTRON LTD0 citations51
US9108231B2Aug 18, 2015
Liquid processing apparatus, liquid processing method, and computer-readable recording medium having program stored therein
TOKYO ELECTRON LTD0 citations51
US11158525B2Oct 26, 2021
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations49
US8354141B2Jan 15, 2013
Liquid treatment apparatus, mounting and dismounting method of a cup body, and storage medium
TOKYO ELECTRON LTD0 citations49
US7984690B2Jul 26, 2011
Liquid treatment apparatus, mounting and dismounting method of a cup body, and storage medium
TOKYO ELECTRON LTD0 citations49
US12007692B2Jun 11, 2024
Nozzle, substrate processing apparatus, and substrate processing method
TOKYO ELECTRON LTD0 citations47
US12424459B2Sep 23, 2025
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations45
US10475671B2Nov 12, 2019
Substrate processing apparatus and method of cleaning substrate processing apparatus
TOKYO ELECTRON LTD0 citations42
US10486208B2Nov 26, 2019
Substrate processing apparatus, method of cleaning substrate processing apparatus, and storage medium
TOKYO ELECTRON LTD0 citations41
US9108228B2Aug 18, 2015
Liquid processing apparatus having switchable nozzles
TOKYO ELECTRON LTD0 citations39
OGATA NOBUHIRO
8 patentsUS8869811B2Oct 28, 2014
Liquid processing apparatus and liquid processing method
OGATA NOBUHIRO5 citations72
US8539906B2Sep 24, 2013
Substrate liquid processing apparatus
OGATA NOBUHIRO5 citations72
US8845815B2Sep 30, 2014
Liquid processing apparatus, liquid processing method, and computer-readable recording medium having program stored therein
OGATA NOBUHIRO5 citations71
US8881751B2Nov 11, 2014
Substrate liquid processing apparatus, method of controlling substrate liquid processing apparatus, and storage medium performing substrate liquid processing apparatus control method on substrate liquid processing apparatus
OGATA NOBUHIRO3 citations62
US8840752B2Sep 23, 2014
Flow passage switching apparatus, processing apparatus, flow passage switching method, processing method and storage medium
OGATA NOBUHIRO3 citations62
US8186298B2May 29, 2012
Coating film forming apparatus, use of coating film forming apparatus, and recording medium
OGATA NOBUHIRO4 citations62
US8758855B2Jun 24, 2014
Coating film forming apparatus, use of coating film forming apparatus, and recording medium
OGATA NOBUHIRO0 citations52
US9484230B2Nov 1, 2016
Substrate liquid processing apparatus
OGATA NOBUHIRO1 citations51
KITANO TAKAHIRO
4 patentsHIGASHIJIMA JIRO
3 patentsUS9355871B2May 31, 2016
Substrate liquid processing apparatus for separating processing solution and atmosphere from each other within collection cup
HIGASHIJIMA JIRO8 citations84
US9048269B2Jun 2, 2015
Substrate liquid treatment apparatus with lift pin plate
HIGASHIJIMA JIRO6 citations73
US9022045B2May 5, 2015
Substrate liquid cleaning apparatus with controlled liquid port ejection angle
HIGASHIJIMA JIRO0 citations41