Inventor
SHOKI TSUTOMU
JP76 patents
⚠️ This page may combine multiple inventors who share the name “SHOKI TSUTOMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOYA CORP
49 patentsUS7390596B2Jun 24, 2008
Reflection type mask blank and reflection type mask and production methods for them
HOYA CORP42 citations92
US6127068AOct 3, 2000
X-ray membrane for x-ray mask, x-ray mask blank, x-ray mask, manufacturing method thereof and method of polishing silicon carbide film
HOYA CORP18 citations92
US11531264B2Dec 20, 2022
Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method
HOYA CORP4 citations84
US10481484B2Nov 19, 2019
Reflective mask blank, reflective mask, method for manufacturing reflective mask blank, and method for manufacturing semiconductor device
HOYA CORP12 citations84
US9864267B2Jan 9, 2018
Reflective mask blank, reflective mask, and method for manufacturing semiconductor device
HOYA CORP8 citations84
US6749973B2Jun 15, 2004
Reflection type mask blank for EUV exposure and reflection type mask for EUV exposure as well as method of producing the mask
HOYA CORP14 citations84
US6737201B2May 18, 2004
Substrate with multilayer film, reflection type mask blank for exposure, reflection type mask for exposure and production method thereof as well as production method of semiconductor device
HOYA CORP14 citations84
US6128363AOct 3, 2000
X-ray mask blank, x-ray mask, and pattern transfer method
HOYA CORP17 citations84
US10001699B2Jun 19, 2018
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
HOYA CORP6 citations83
US9377679B2Jun 28, 2016
Reflective mask blank and method for manufacturing same, method for manufacturing reflective mask, and method for manufacturing semiconductor device
HOYA CORP5 citations83
US9195131B2Nov 24, 2015
Mask blank glass substrate, multilayer reflective film coated substrate, mask blank, mask, and methods of manufacturing the same
HOYA CORP7 citations83
US7981573B2Jul 19, 2011
Reflective mask blank, reflective mask and methods of producing the mask blank and the mask
HOYA CORP7 citations83
US6366640B1Apr 2, 2002
X-ray mask blank, X-ray mask and method for manufacturing the same
HOYA CORP8 citations74
US5989755ANov 23, 1999
Method of manufacturing x-ray mask blank and method of manufacturing x-ray membrane for x-ray mask
HOYA CORP7 citations74
US5958627ASep 28, 1999
X-ray mask blank and method of manufacturing the same
HOYA CORP7 citations74
US12111566B2Oct 8, 2024
Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method
HOYA CORP2 citations73
US12105413B2Oct 1, 2024
Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device
HOYA CORP2 citations73
US11815807B2Nov 14, 2023
Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device
HOYA CORP2 citations73
US11550215B2Jan 10, 2023
Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device
HOYA CORP3 citations73
US11262647B2Mar 1, 2022
Substrate with multilayer reflective film, reflective mask blank, reflective mask, and semiconductor device manufacturing method
HOYA CORP1 citations73
US11187972B2Nov 30, 2021
Reflective mask blank, method of manufacturing reflective mask and method of manufacturing semiconductor device
HOYA CORP3 citations73
US10921705B2Feb 16, 2021
Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP2 citations73
US8372564B2Feb 12, 2013
Reflective mask, reflective mask blank and method of manufacturing reflective mask
HOYA CORP6 citations73
US7056627B2Jun 6, 2006
Method of manufacturing a reflection type mask blank and method of manufacturing a reflection type mask
HOYA CORP10 citations73
US11480867B2Oct 25, 2022
Reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP4 citations72
US11003068B2May 11, 2021
Reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP2 citations72
US9897909B2Feb 20, 2018
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method
HOYA CORP2 citations72
US9726969B2Aug 8, 2017
Reflective mask blank, method of manufacturing same, reflective mask and method of manufacturing semiconductor device
HOYA CORP2 citations72
US9720315B2Aug 1, 2017
Reflective mask blank, method of manufacturing reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP2 citations72
US12313968B2May 27, 2025
Reflective mask blank, reflective mask, and method for manufacturing semiconductor device
HOYA CORP0 citations63
US12072619B2Aug 27, 2024
Reflective mask blank, reflective mask, and method for manufacturing reflective mask and semiconductor device
HOYA CORP0 citations63
US12019366B2Jun 25, 2024
Reflective mask blank, reflective mask, and method for manufacturing reflective mask and semiconductor device
HOYA CORP0 citations63
US11561463B2Jan 24, 2023
Substrate with conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and semiconductor device manufacturing method
HOYA CORP0 citations63
US8367279B2Feb 5, 2013
Reflective mask blank, reflective mask, and method of manufacturing the same
HOYA CORP2 citations63
US7910264B2Mar 22, 2011
Reflective mask blank for exposure, reflective mask for exposure, method of producing a semiconductor device, and substrate provided with multilayer reflective film
HOYA CORP2 citations63
US7314688B2Jan 1, 2008
Method of producing a reflection mask blank, method of producing a reflection mask, and method of producing a semiconductor device
HOYA CORP4 citations63
US7294438B2Nov 13, 2007
Method of producing a reflective mask and method of producing a semiconductor device
HOYA CORP2 citations63
US6960412B2Nov 1, 2005
Reflective-type mask blank for exposure, method of producing the same, and reflective-type mask for exposure
HOYA CORP2 citations63
US6797368B2Sep 28, 2004
Reflective-type mask blank for exposure, method of producing the same, and reflective-type mask for exposure
HOYA CORP5 citations63
US12135496B2Nov 5, 2024
Reflective mask blank and reflective mask
HOYA CORP0 citations62
US12025911B2Jul 2, 2024
Reflective structure, reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP0 citations62
US11880130B2Jan 23, 2024
Reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP0 citations62
US11852964B2Dec 26, 2023
Method for manufacturing reflective mask blank, reflective mask blank, method for manufacturing reflective mask, reflective mask, and method for manufacturing semiconductor device
HOYA CORP0 citations62
US11815806B2Nov 14, 2023
Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method
HOYA CORP0 citations62
US11681214B2Jun 20, 2023
Substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP0 citations62
US11281090B2Mar 22, 2022
Substrate with a multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor device
HOYA CORP0 citations62
US11249385B2Feb 15, 2022
Reflective mask blank, reflective mask, method of manufacturing same, and method of manufacturing semiconductor device
HOYA CORP0 citations62
US11131921B2Sep 28, 2021
Method for manufacturing reflective mask blank, and method for manufacturing reflective mask
HOYA CORP0 citations62
US11048159B2Jun 29, 2021
Method for manufacturing reflective mask blank, reflective mask blank, method for manufacturing reflective mask, reflective mask, and method for manufacturing semiconductor device
HOYA CORP0 citations62
SHOKI TSUTOMU
1 patentShowing the top 50 of 76 patents by PatentIndex Score.