Inventor
TZOU KAAN-LU
TW4 patents
Patents
4 patentsUS6727159B2Apr 27, 2004
Method of forming a shallow trench isolation in a semiconductor substrate
NANYA TECHNOLOGY CORP23 citations91
US7341952B2Mar 11, 2008
Multi-layer hard mask structure for etching deep trench in substrate
NANYA TECHNOLOGY CORP6 citations72
US7029753B2Apr 18, 2006
Multi-layer hard mask structure for etching deep trench in substrate
NANYA TECHNOLOGY CORP4 citations61
US6900118B2May 31, 2005
Method for preventing contact defects in interlayer dielectric layer
NANYA TECHNOLOGY CORP1 citations50