Inventor
OKUCHI HISASHI
JP41 patents
⚠️ This page may combine multiple inventors who share the name “OKUCHI HISASHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
17 patentsUS7749909B2Jul 6, 2010
Method of treating a semiconductor substrate
TOSHIBA KK46 citations94
US7838425B2Nov 23, 2010
Method of treating surface of semiconductor substrate
TOSHIBA KK27 citations92
US7635397B2Dec 22, 2009
Manufacturing apparatus for semiconductor device and manufacturing method for semiconductor device
TOSHIBA KK16 citations92
US6492271B1Dec 10, 2002
Semiconductor device and method of manufacturing the same
TOSHIBA KK27 citations92
US6286524B1Sep 11, 2001
Wafer drying apparatus and method with residual particle removability enhancement
TOSHIBA KK46 citations92
US7985683B2Jul 26, 2011
Method of treating a semiconductor substrate
TOSHIBA KK13 citations91
US9673217B1Jun 6, 2017
Semiconductor device and method for manufacturing same
TOSHIBA KK6 citations72
US9384980B2Jul 5, 2016
Manufacturing method of semiconductor device
TOSHIBA KK3 citations72
US8372212B2Feb 12, 2013
Supercritical drying method and apparatus for semiconductor substrates
TOSHIBA KK5 citations72
US7776756B1Aug 17, 2010
Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device
TOSHIBA KK3 citations62
US7267742B2Sep 11, 2007
Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device
TOSHIBA KK3 citations62
US7097784B2Aug 29, 2006
Etching method and apparatus for semiconductor wafers
TOSHIBA KK4 citations62
US10096462B2Oct 9, 2018
Substrate processing method and storage medium
TOSHIBA KK1 citations52
US9570286B2Feb 14, 2017
Supercritical drying method for semiconductor substrate
TOSHIBA KK1 citations52
US9065064B2Jun 23, 2015
Manufacturing method and manufacturing apparatus of functional element
TOSHIBA KK1 citations52
US8865563B2Oct 21, 2014
Film embedding method and semiconductor device
TOSHIBA KK0 citations52
US8375964B2Feb 19, 2013
Template cleaning method, system, and apparatus
TOSHIBA KK0 citations51
TOSHIBA MEMORY CORP
7 patentsUS9991111B2Jun 5, 2018
Apparatus and method of treating surface of semiconductor substrate
TOSHIBA MEMORY CORP2 citations73
US9859111B2Jan 2, 2018
Apparatus and method of treating surface of semiconductor substrate
TOSHIBA MEMORY CORP2 citations73
US10522596B2Dec 31, 2019
Semiconductor storage device comprising resistance change film and method of manufacturing the same
TOSHIBA MEMORY CORP1 citations62
US10529588B2Jan 7, 2020
Substrate treatment method and substrate treatment apparatus
TOSHIBA MEMORY CORP0 citations51
US10014186B2Jul 3, 2018
Substrate treatment method and substrate treatment apparatus
TOSHIBA MEMORY CORP0 citations51
US9991159B2Jun 5, 2018
Semiconductor device manufacture method
TOSHIBA MEMORY CORP1 citations51
US10573508B2Feb 25, 2020
Surface treatment apparatus and method for semiconductor substrate
TOSHIBA MEMORY CORP0 citations41
YOSHIMIZU YASUHITO
3 patentsUS8772164B2Jul 8, 2014
Method for forming interconnection pattern and semiconductor device
YOSHIMIZU YASUHITO0 citations51
US8741168B2Jun 3, 2014
Wet etching method for silicon nitride film
YOSHIMIZU YASUHITO0 citations51
US8695145B2Apr 15, 2014
Cleaning method, cleaning apparatus
YOSHIMIZU YASUHITO0 citations51