Inventor
KOSHIMIZU CHISHIO
JP168 patents
⚠️ This page may combine multiple inventors who share the name “KOSHIMIZU CHISHIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
36 patentsUS9941097B2Apr 10, 2018
Plasma processing apparatus
TOKYO ELECTRON LTD110 citations99
US7951262B2May 31, 2011
Plasma processing apparatus and method
TOKYO ELECTRON LTD486 citations99
US6214162B1Apr 10, 2001
Plasma processing apparatus
TOKYO ELECTRON LTD159 citations99
US5571366ANov 5, 1996
Plasma processing apparatus
TOKYO ELECTRON LTD502 citations99
US5290383AMar 1, 1994
Plasma-process system with improved end-point detecting scheme
TOKYO ELECTRON LTD198 citations99
US8343306B2Jan 1, 2013
Plasma processing apparatus and method of plasma distribution correction
TOKYO ELECTRON LTD81 citations98
US7415940B2Aug 26, 2008
Plasma processor
TOKYO ELECTRON LTD75 citations98
US6000360ADec 14, 1999
Plasma processing apparatus
TOKYO ELECTRON LTD102 citations98
US5997687ADec 7, 1999
Plasma processing apparatus
TOKYO ELECTRON LTD141 citations98
US5980767ANov 9, 1999
Method and devices for detecting the end point of plasma process
TOKYO ELECTRON LTD116 citations98
US5935373AAug 10, 1999
Plasma processing apparatus
TOKYO ELECTRON LTD117 citations98
US10672589B2Jun 2, 2020
Plasma processing apparatus and control method
TOKYO ELECTRON LTD45 citations97
US7988816B2Aug 2, 2011
Plasma processing apparatus and method
TOKYO ELECTRON LTD63 citations97
US5928532AJul 27, 1999
Method of detecting end point of plasma processing and apparatus for the same
TOKYO ELECTRON LTD70 citations96
US5565114AOct 15, 1996
Method and device for detecting the end point of plasma process
TOKYO ELECTRON LTD78 citations96
US5322590AJun 21, 1994
Plasma-process system with improved end-point detecting scheme
TOKYO ELECTRON LTD77 citations96
US5770098AJun 23, 1998
Etching process
TOKYO ELECTRON LTD144 citations95
US7446881B2Nov 4, 2008
System, apparatus, and method for determining temperature/thickness of an object using light interference measurements
TOKYO ELECTRON LTD30 citations93
US7355715B2Apr 8, 2008
Temperature measuring apparatus, temperature measurement method, temperature measurement system, control system and control method
TOKYO ELECTRON LTD21 citations93
US5980687ANov 9, 1999
Plasma processing apparatus comprising a compensating-process-gas supply means in synchronism with a rotating magnetic field
TOKYO ELECTRON LTD55 citations93
US5374327ADec 20, 1994
Plasma processing method
TOKYO ELECTRON LTD48 citations93
US7740737B2Jun 22, 2010
Plasma processing apparatus and method
TOKYO ELECTRON LTD25 citations92
US7582182B2Sep 1, 2009
Method and apparatus for measuring electron density of plasma and plasma processing apparatus
TOKYO ELECTRON LTD14 citations92
US7339656B2Mar 4, 2008
Method and apparatus for measuring electron density of plasma and plasma processing apparatus
TOKYO ELECTRON LTD20 citations92
US7018506B2Mar 28, 2006
Plasma processing apparatus
TOKYO ELECTRON LTD20 citations92
US6818560B1Nov 16, 2004
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD37 citations92
US6576860B2Jun 10, 2003
Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate
TOKYO ELECTRON LTD28 citations92
US6426477B1Jul 30, 2002
Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate
TOKYO ELECTRON LTD32 citations92
US5783492AJul 21, 1998
Plasma processing method, plasma processing apparatus, and plasma generating apparatus
TOKYO ELECTRON LTD50 citations91
US11315765B2Apr 26, 2022
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD8 citations86
US11742181B2Aug 29, 2023
Control method and plasma processing apparatus
TOKYO ELECTRON LTD5 citations85
US11476089B2Oct 18, 2022
Control method and plasma processing apparatus
TOKYO ELECTRON LTD7 citations85
US10325758B2Jun 18, 2019
Plasma processing apparatus
TOKYO ELECTRON LTD13 citations84
US9997332B2Jun 12, 2018
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD11 citations84
US9490105B2Nov 8, 2016
Plasma processing apparatus and method
TOKYO ELECTRON LTD6 citations84
US9111747B2Aug 18, 2015
Film deposition apparatus, substrate processing apparatus and film deposition method
TOKYO ELECTRON LTD15 citations84
YAMAZAWA YOHEI
4 patentsUS9313872B2Apr 12, 2016
Plasma processing apparatus and plasma processing method
YAMAZAWA YOHEI52 citations98
US9253867B2Feb 2, 2016
Plasma processing apparatus and plasma processing method
YAMAZAWA YOHEI11 citations84
US8741097B2Jun 3, 2014
Plasma processing apparatus and plasma processing method
YAMAZAWA YOHEI7 citations84
US8608903B2Dec 17, 2013
Plasma processing apparatus and plasma processing method
YAMAZAWA YOHEI9 citations84
KOSHIMIZU CHISHIO
4 patentsUS8894806B2Nov 25, 2014
Plasma processing apparatus and plasma processing method
KOSHIMIZU CHISHIO22 citations92
US8298371B2Oct 30, 2012
Plasma processing apparatus
KOSHIMIZU CHISHIO26 citations92
US8741095B2Jun 3, 2014
Plasma processing apparatus, plasma processing method, and computer readable storage medium
KOSHIMIZU CHISHIO16 citations84
US8293068B2Oct 23, 2012
Plasma processing apparatus
KOSHIMIZU CHISHIO17 citations84
TOKYO ELECTRON AT LTD
2 patentsTOKYO ELECTRON YAMANASHI LTD
1 patentKOSHIISHI AKIRA
1 patentTEL YAMANISHI KK
1 patentYAMAWAKU JUN
1 patentShowing the top 50 of 168 patents by PatentIndex Score.