Inventor
KAWANO HISASHI
JP18 patents
Patents
18 patentsUS10272478B2Apr 30, 2019
Substrate processing system, substrate cleaning method, and recording medium
TOKYO ELECTRON LTD7 citations83
US9378940B2Jun 28, 2016
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD9 citations82
US10923368B2Feb 16, 2021
Substrate processing apparatus, substrate processing method, and storage medium
TOKYO ELECTRON LTD3 citations72
US10121646B2Nov 6, 2018
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD2 citations72
US9953840B2Apr 24, 2018
Substrate processing method and substrate processing system
TOKYO ELECTRON LTD5 citations72
US9818598B2Nov 14, 2017
Substrate cleaning method and recording medium
TOKYO ELECTRON LTD4 citations72
US10792711B2Oct 6, 2020
Substrate processing system, substrate cleaning method, and recording medium
TOKYO ELECTRON LTD1 citations62
US10651061B2May 12, 2020
Substrate processing apparatus, substrate processing method and recording medium
TOKYO ELECTRON LTD1 citations62
US12575350B2Mar 10, 2026
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations61
US11087992B2Aug 10, 2021
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD1 citations61
US11075096B2Jul 27, 2021
Substrate processing apparatus
TOKYO ELECTRON LTD1 citations61
US7924396B2Apr 12, 2011
Coating/developing apparatus and pattern forming method
TOKYO ELECTRON LTD3 citations58
US10192758B2Jan 29, 2019
Substrate processing apparatus
TOKYO ELECTRON LTD0 citations51
US9870914B2Jan 16, 2018
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD1 citations51
US9805957B2Oct 31, 2017
Substrate processing apparatus, substrate processing method and computer-readable storage medium recording therein substrate processing program
TOKYO ELECTRON LTD0 citations51
US11424141B2Aug 23, 2022
Substrate processing apparatus, substrate processing method and recording medium
TOKYO ELECTRON LTD0 citations49
US10062586B2Aug 28, 2018
Chemical fluid processing apparatus and chemical fluid processing method
TOKYO ELECTRON LTD0 citations39
US9922849B2Mar 20, 2018
Substrate liquid processing apparatus having nozzle with multiple flow paths and substrate liquid processing method thereof
TOKYO ELECTRON LTD0 citations37