Inventor
ONOUE TAKAHIRO
SG30 patents
⚠️ This page may combine multiple inventors who share the name “ONOUE TAKAHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOYA CORP
14 patentsUS10481484B2Nov 19, 2019
Reflective mask blank, reflective mask, method for manufacturing reflective mask blank, and method for manufacturing semiconductor device
HOYA CORP12 citations84
US9864267B2Jan 9, 2018
Reflective mask blank, reflective mask, and method for manufacturing semiconductor device
HOYA CORP8 citations84
US11480867B2Oct 25, 2022
Reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP4 citations72
US11003068B2May 11, 2021
Reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP2 citations72
US9740091B2Aug 22, 2017
Substrate with multilayer reflective film, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method of manufacturing the same, and method of manufacturing a semiconductor device
HOYA CORP4 citations72
US9383637B2Jul 5, 2016
Substrate with multilayer reflective film, reflective mask blank for EUV lithography, method of manufacturing reflective mask for EUV lithography and method of manufacturing semiconductor device
HOYA CORP3 citations72
US12591173B2Mar 31, 2026
Substrate with multilayer reflective film, reflective mask blank, reflective mask, and method for manufacturing semiconductor device
HOYA CORP0 citations62
US12135496B2Nov 5, 2024
Reflective mask blank and reflective mask
HOYA CORP0 citations62
US11880130B2Jan 23, 2024
Reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP0 citations62
US11852964B2Dec 26, 2023
Method for manufacturing reflective mask blank, reflective mask blank, method for manufacturing reflective mask, reflective mask, and method for manufacturing semiconductor device
HOYA CORP0 citations62
US11454878B2Sep 27, 2022
Substrate with multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device
HOYA CORP0 citations62
US11048159B2Jun 29, 2021
Method for manufacturing reflective mask blank, reflective mask blank, method for manufacturing reflective mask, reflective mask, and method for manufacturing semiconductor device
HOYA CORP0 citations62
US11237472B2Feb 1, 2022
Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method
HOYA CORP0 citations58
US9720317B2Aug 1, 2017
Substrate with a multilayer reflective film, reflective mask blank for EUV lithography, reflective mask for EUV lithography and method of manufacturing the same, and method of manufacturing a semiconductor device
HOYA CORP0 citations52
ONOUE TAKAHIRO
8 patentsUS8603649B2Dec 10, 2013
Perpendicular magnetic recording medium
ONOUE TAKAHIRO69 citations97
US8592061B2Nov 26, 2013
Magnetic recording medium with controlled grain diameters
ONOUE TAKAHIRO70 citations97
US8580410B2Nov 12, 2013
Perpendicular magnetic recording medium and process for manufacture thereof
ONOUE TAKAHIRO78 citations97
US8431258B2Apr 30, 2013
Perpendicular magnetic recording medium and method of manufacturing the same
ONOUE TAKAHIRO71 citations97
US9064518B2Jun 23, 2015
Perpendicular magnetic recording medium
ONOUE TAKAHIRO0 citations41
US9047903B2Jun 2, 2015
Perpendicular magnetic recording medium and process for manufacture thereof
ONOUE TAKAHIRO0 citations41
US8895163B2Nov 25, 2014
Perpendicular magnetic recording medium
ONOUE TAKAHIRO0 citations41
US8871368B2Oct 28, 2014
Perpendicular magnetic recording medium and process for manufacture thereof
ONOUE TAKAHIRO0 citations39
TACHIBANA TOSHIAKI
2 patentsWD MEDIA SINGAPORE PTE LTD
2 patentsUS9183869B2Nov 10, 2015
Perpendicular magnetic recording medium and method of manufacturing perpendicular magnetic recording medium
WD MEDIA SINGAPORE PTE LTD0 citations52
US9142241B2Sep 22, 2015
Perpendicular magnetic recording medium and method of manufacturing the same
WD MEDIA SINGAPORE PTE LTD0 citations51