P

Inventor

MIZUNO SHIGERU

JP58 patents
⚠️ This page may combine multiple inventors who share the name “MIZUNO SHIGERU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ANELVA CORP

20 patents
US5494494AFeb 27, 1996

Integrated module multi-chamber CVD processing system and its method for processing substrates

ANELVA CORP666 citations99
US5676758AOct 14, 1997

CVD apparatus

ANELVA CORP209 citations98
US5766363AJun 16, 1998

Heater for CVD apparatus

ANELVA CORP56 citations96
US5534072AJul 9, 1996

Integrated module multi-chamber CVD processing system and its method for processing subtrates

ANELVA CORP58 citations96
US5505779AApr 9, 1996

Integrated module multi-chamber CVD processing system and its method for processing substrates

ANELVA CORP73 citations96
US5624499AApr 29, 1997

CVD apparatus

ANELVA CORP70 citations95
US5033407AJul 23, 1991

Low pressure vapor phase growth apparatus

ANELVA CORP94 citations95
US6103304AAug 15, 2000

Chemical vapor deposition apparatus

ANELVA CORP27 citations93
US6085690AJul 11, 2000

Chemical vapor deposition apparatus

ANELVA CORP29 citations93
US6199505B1Mar 13, 2001

Plasma processing apparatus

ANELVA CORP38 citations92
US6129046AOct 10, 2000

Substrate processing apparatus

ANELVA CORP46 citations92
US6070552AJun 6, 2000

Substrate processing apparatus

ANELVA CORP26 citations92
US6059985AMay 9, 2000

Method of processing a substrate and apparatus for the method

ANELVA CORP37 citations92
US6872289B2Mar 29, 2005

Thin film fabrication method and thin film fabrication apparatus

ANELVA CORP42 citations91
US6663714B2Dec 16, 2003

CVD apparatus

ANELVA CORP63 citations91
US6348238B1Feb 19, 2002

Thin film fabrication method and thin film fabrication apparatus

ANELVA CORP20 citations91
US5893962AApr 13, 1999

Electrode unit for in-situ cleaning in thermal CVD apparatus

ANELVA CORP28 citations91
US5728629AMar 17, 1998

Process for preventing deposition on inner surfaces of CVD reactor

ANELVA CORP46 citations91
US5840366ANov 24, 1998

Method of forming thin film

ANELVA CORP19 citations90
US5956616ASep 21, 1999

Method of depositing thin films by plasma-enhanced chemical vapor deposition

ANELVA CORP12 citations73

TOKYO ELECTRON LTD

9 patents

SHINKO ELECTRIC IND CO

6 patents

BROTHER IND LTD

5 patents

CANON ANELVA CORP

4 patents

ISHIZAKA TADAHIRO

2 patents

SAWADA KEN

2 patents

SETEK M KK

1 patent

RICOH KK

1 patent

Showing the top 50 of 58 patents by PatentIndex Score.