P

Inventor

TAKAHASHI NOBUYUKI

JP236 patents
⚠️ This page may combine multiple inventors who share the name “TAKAHASHI NOBUYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ANELVA CORP

29 patents
US6382895B1May 7, 2002

Substrate processing apparatus

ANELVA CORP147 citations99
US6077403AJun 20, 2000

Sputtering device and sputtering method

ANELVA CORP159 citations99
US5494494AFeb 27, 1996

Integrated module multi-chamber CVD processing system and its method for processing substrates

ANELVA CORP666 citations99
US4825808AMay 2, 1989

Substrate processing apparatus

ANELVA CORP250 citations99
US5925227AJul 20, 1999

Multichamber sputtering apparatus

ANELVA CORP90 citations98
US5676758AOct 14, 1997

CVD apparatus

ANELVA CORP209 citations98
US4643629AFeb 17, 1987

Automatic loader

ANELVA CORP164 citations98
US6361667B1Mar 26, 2002

Ionization sputtering apparatus

ANELVA CORP107 citations97
US6827788B2Dec 7, 2004

Substrate processing device and through-chamber

ANELVA CORP62 citations96
US5968327AOct 19, 1999

Ionizing sputter device using a coil shield

ANELVA CORP66 citations96
US5766363AJun 16, 1998

Heater for CVD apparatus

ANELVA CORP56 citations96
US5534072AJul 9, 1996

Integrated module multi-chamber CVD processing system and its method for processing subtrates

ANELVA CORP58 citations96
US5505779AApr 9, 1996

Integrated module multi-chamber CVD processing system and its method for processing substrates

ANELVA CORP73 citations96
US5439574AAug 8, 1995

Method for successive formation of thin films

ANELVA CORP60 citations96
US5113929AMay 19, 1992

Temperature control system for semiconductor wafer or substrate

ANELVA CORP58 citations96
US5624499AApr 29, 1997

CVD apparatus

ANELVA CORP70 citations95
US5288379AFeb 22, 1994

Multi-chamber integrated process system

ANELVA CORP116 citations95
US4747928AMay 31, 1988

Substrate processing apparatus including wafer transporting and substrate cooling mechanisms

ANELVA CORP57 citations95
US6800183B2Oct 5, 2004

Sputtering device

ANELVA CORP32 citations93
US6022461AFeb 8, 2000

Sputtering apparatus

ANELVA CORP30 citations93
US5470451ANov 28, 1995

Sputtering apparatus

ANELVA CORP27 citations93
US5374343ADec 20, 1994

Magnetron cathode assembly

ANELVA CORP46 citations93
US4674621AJun 23, 1987

Substrate processing apparatus

ANELVA CORP39 citations93
US4388034AJun 14, 1983

Processing apparatus comprising a cassette member temporarily swingable to vertically hold a plurality of substrates

ANELVA CORP31 citations93
US6386511B1May 14, 2002

Gate valve apparatus

ANELVA CORP20 citations92
US6129046AOct 10, 2000

Substrate processing apparatus

ANELVA CORP46 citations92
US6070552AJun 6, 2000

Substrate processing apparatus

ANELVA CORP26 citations92
US6059985AMay 9, 2000

Method of processing a substrate and apparatus for the method

ANELVA CORP37 citations92
US5944968AAug 31, 1999

Sputtering apparatus

ANELVA CORP50 citations92

SHARP KK

4 patents

HONDA MOTOR CO LTD

4 patents

MINEBEA CO LTD

2 patents

TAKAHASHI NOBUYUKI

1 patent

HITACHI LTD

1 patent

MITSUBISHI CORP

1 patent

SUMITOMO CHEMICAL CO

1 patent

YAZAKI CORP

1 patent

MINOLTA CO LTD

1 patent

SONY CORP

1 patent

CANON KK

1 patent

SANYO ELECTRIC CO

1 patent

MITSUBISHI ELECTRIC CORP

1 patent

APPLIED MATERIALS INC

1 patent

Showing the top 50 of 236 patents by PatentIndex Score.