Inventor
CHANG SHANG-WERN
TW13 patents
⚠️ This page may combine multiple inventors who share the name “CHANG SHANG-WERN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
EVERLIGHT USA INC
6 patentsUS6265131B1Jul 24, 2001
Alicyclic dissolution inhibitors and positive potoresist composition containing the same
EVERLIGHT USA INC19 citations91
US6441115B1Aug 27, 2002
Photosensitive polymer
EVERLIGHT USA INC13 citations72
US6316159B1Nov 13, 2001
Chemical amplified photoresist composition
EVERLIGHT USA INC10 citations72
US6271412B1Aug 7, 2001
Photosensitive monomer
EVERLIGHT USA INC8 citations72
US6376700B1Apr 23, 2002
Alicyclic compound
EVERLIGHT USA INC3 citations61
US6294309B1Sep 25, 2001
Positive photoresist composition containing alicyclic dissolution inhibitors
EVERLIGHT USA INC3 citations61
TAIWAN SEMICONDUCTOR MFG CO LTD
6 patentsUS11442364B2Sep 13, 2022
Materials and methods for forming resist bottom layer
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US11320738B2May 3, 2022
Pattern formation method and material for manufacturing semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11703766B2Jul 18, 2023
Materials and methods for forming resist bottom layer
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations61
US12566374B2Mar 3, 2026
Photoresist composition and method of manufacturing semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9814097B2Nov 7, 2017
Baking apparatus for priming substrate
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
US9563946B2Feb 7, 2017
Overlay metrology method and overlay control method and system
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations41