Inventor
TRUONG HOA D
US35 patents
⚠️ This page may combine multiple inventors who share the name “TRUONG HOA D”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
26 patentsUS6806026B2Oct 19, 2004
Photoresist composition
IBM62 citations95
US7141692B2Nov 28, 2006
Molecular photoresists containing nonpolymeric silsesquioxanes
IBM19 citations93
US6794110B2Sep 21, 2004
Polymer blend and associated methods of preparation and use
IBM21 citations92
US9671694B1Jun 6, 2017
Wet strippable gap fill materials
IBM12 citations84
US7883828B2Feb 8, 2011
Functionalized carbosilane polymers and photoresist compositions containing the same
IBM7 citations84
US7358029B2Apr 15, 2008
Low activation energy dissolution modification agents for photoresist applications
IBM9 citations84
US7193023B2Mar 20, 2007
Low activation energy photoresists
IBM11 citations84
US9244345B1Jan 26, 2016
Non-ionic photo-acid generating polymers for resist applications
IBM13 citations83
US7135595B2Nov 14, 2006
Photoresist composition
IBM4 citations73
US7014980B2Mar 21, 2006
Photoresist composition
IBM10 citations73
US9879152B2Jan 30, 2018
Block copolymers for directed self-assembly applications
IBM2 citations72
US9057960B2Jun 16, 2015
Resist performance for the negative tone develop organic development process
IBM4 citations72
US7951525B2May 31, 2011
Low outgassing photoresist compositions
IBM2 citations63
US7824845B2Nov 2, 2010
Functionalized carbosilane polymers and photoresist compositions containing the same
IBM2 citations63
US7820369B2Oct 26, 2010
Method for patterning a low activation energy photoresist
IBM3 citations63
US7781157B2Aug 24, 2010
Method for using compositions containing fluorocarbinols in lithographic processes
IBM4 citations63
US7622240B2Nov 24, 2009
Low blur molecular resist
IBM4 citations63
US7476492B2Jan 13, 2009
Low activation energy photoresist composition and process for its use
IBM4 citations63
US8900802B2Dec 2, 2014
Positive tone organic solvent developed chemically amplified resist
IBM3 citations62
US8034532B2Oct 11, 2011
High contact angle topcoat material and use thereof in lithography process
IBM4 citations62
US7759044B2Jul 20, 2010
Low activation energy dissolution modification agents for photoresist applications
IBM0 citations52
US9983475B2May 29, 2018
Fluorinated sulfonate esters of aryl ketones for non-ionic photo-acid generators
IBM0 citations51
US9950999B2Apr 24, 2018
Non-ionic low diffusing photo-acid generators
IBM0 citations51
US9951164B2Apr 24, 2018
Non-ionic aryl ketone based polymeric photo-acid generators
IBM0 citations51
US10915023B2Feb 9, 2021
Nitrogen heterocycle-containing monolayers on metal oxides for binding biopolymers
IBM0 citations49
US9389516B2Jul 12, 2016
Resist performance for the negative tone develop organic development process
IBM0 citations48
ALLEN ROBERT D
3 patentsUS8334088B2Dec 18, 2012
Functionalized carbosilane polymers and photoresist compositions containing the same
ALLEN ROBERT D0 citations52
US8802347B2Aug 12, 2014
Silicon containing coating compositions and methods of use
ALLEN ROBERT D0 citations51
US9057951B2Jun 16, 2015
Chemically amplified photoresist composition and process for its use
ALLEN ROBERT D0 citations41