Inventor

CHEN RYAN CHIA-JEN

TW152 patents

⚠️ This page may combine multiple inventors who share the name “CHEN RYAN CHIA-JEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHEN RYAN CHIA-JEN

TAIWAN SEMICONDUCTOR MFG CO LTD

Semiconductor structure cutting process and structures formed thereby

Metal gate isolation structure and method forming same

Metal gate structure cutting process

FinFET device

Semiconductor structure cutting process and structures formed thereby

Semiconductor structure cutting process and structures formed thereby

Fin field-effect transistor devices and methods of forming the same

Cut metal gate with slanted sidewalls

FinFET device

Metal gate structure and methods of fabricating thereof

Semiconductor device and method

Method of forming a single metal that performs N work function and P work function in a high-k/metal gate process

Composite dummy gate with conformal polysilicon layer for FinFET device

Process of manufacturing Fin-FET device

Integrated high-K/metal gate in CMOS process flow

Method for forming fin field effect transistor (FinFET) device structure

Semiconductor structure and method for forming the same

Residue-free metal gate cutting for fin-like field effect transistor

Cut metal gate processes

Semiconductor structure and method of manufacturing the same

Semiconductor structure and method for forming the same

Semiconductor device with cut metal gate and method of manufacture

Metal gate structure cutting process

Methods for forming fin field-effect transistors

Method of manufacturing a semiconductor device

Cut metal gate processes

Residue-free metal gate cutting for fin-like field effect transistor

Metal gate isolation structure and method forming same

TAIWAN SEMICONDUCTOR MFG

Integrated high-K/metal gate in CMOS process flow

Method of making a FinFET device

High-k dielectric metal gate device structure and method for forming the same

Method of reducing a critical dimension of a semiconductor device

FinFET device structure and methods of making same

Integrated high-k/metal gate in CMOS process flow

High-k metal gate CMOS patterning method

Patterning methodology for uniformity control

Method of integrating high-K/metal gate in CMOS process flow

FinFETs with regrown source/drain and methods for forming the same

Simultaneous formation of source/drain openings with different profiles

Etching process to avoid polysilicon notching

Lin yu chao

Fin field effect transistors

Patterning methodology for uniformity control

CHANG CHIA-WEI

Fin profile structure and method of making same

Methods for controlling line dimensions in spacer alignment double patterning semiconductor processing

NG JIN-AUN

Spacer structure of a field effect transistor with an oxygen-containing layer between two oxygen-sealing layers

HUANG KUO BIN

High temperature anneal for aluminum surface protection

ZHU MING

Metal gate structure of a semiconductor device

LIN YIH-ANN

Method of forming a single metal that performs N work function and P work function in a high-k/metal gate process

CHEN RYAN CHIA-JEN

Semiconductor fin structures and methods for forming the same

LIU CHIA-CHU

Method of forming a FinFET device