Inventor
PARK PILYEON
US8 patents
Patents
8 patentsUS9425041B2Aug 23, 2016
Isotropic atomic layer etch for silicon oxides using no activation
LAM RES CORP143 citations97
US11011388B2May 18, 2021
Plasma apparatus for high aspect ratio selective lateral etch using cyclic passivation and etching
LAM RES CORP7 citations82
US11469079B2Oct 11, 2022
Ultrahigh selective nitride etch to form FinFET devices
LAM RES CORP3 citations71
US10679868B2Jun 9, 2020
Isotropic atomic layer etch for silicon oxides using no activation
LAM RES CORP3 citations71
US9911620B2Mar 6, 2018
Method for achieving ultra-high selectivity while etching silicon nitride
LAM RES CORP3 citations71
US9870932B1Jan 16, 2018
Pressure purge etch method for etching complex 3-D structures
LAM RES CORP4 citations71
US10192751B2Jan 29, 2019
Systems and methods for ultrahigh selective nitride etch
LAM RES CORP1 citations61
US10276398B2Apr 30, 2019
High aspect ratio selective lateral etch using cyclic passivation and etching
LAM RES CORP1 citations60