Inventor
KINOSHITA YOHEI
JP17 patents
⚠️ This page may combine multiple inventors who share the name “KINOSHITA YOHEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
14 patentsUS6340553B1Jan 22, 2002
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD26 citations92
US6630282B2Oct 7, 2003
Crosslinked positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD14 citations83
US7608381B2Oct 27, 2009
Polymer compound, positive resist composition and process for forming resist pattern
TOKYO OHKA KOGYO CO LTD7 citations73
US11377522B2Jul 5, 2022
Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica-based coating, and production method for silicon-containing polymer
TOKYO OHKA KOGYO CO LTD0 citations62
US7723007B2May 25, 2010
Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method
TOKYO OHKA KOGYO CO LTD5 citations62
US6818380B2Nov 16, 2004
Method for the preparation of a semiconductor device
TOKYO OHKA KOGYO CO LTD4 citations62
US6777158B2Aug 17, 2004
Method for the preparation of a semiconductor device
TOKYO OHKA KOGYO CO LTD3 citations62
US6485887B2Nov 26, 2002
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD4 citations62
US7803512B2Sep 28, 2010
Positive resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD4 citations61
US7781144B2Aug 24, 2010
Positive resist composition and resist pattern forming method
TOKYO OHKA KOGYO CO LTD5 citations61
US7923192B2Apr 12, 2011
Base material for pattern-forming material, positive resist composition and method of resist pattern formation
TOKYO OHKA KOGYO CO LTD1 citations52
US7919227B2Apr 5, 2011
Positive resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations52
US7816066B2Oct 19, 2010
Positive resist composition and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD1 citations51
US7858286B2Dec 28, 2010
Positive resist composition and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations40